SCHEMBL29367221

SCHEMBL29367221

OCc1c2ccccc2cc2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 1/20 0.60
L3MBTL1 Q9Y468 1/20 0.60
ALDH1A1 P00352 5/20 0.46
KDM4E B2RXH2 4/20 0.46
HSD17B10 Q99714 3/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
CYP1A2 P05177 3/20 0.46
HPGD P15428 3/20 0.46
CYP2C19 P33261 2/20 0.46
GLA P06280 1/20 0.46
CYP2C9 P11712 1/20 0.45
TRPM4 Q8TD43 1/20 0.44
POLB P06746 3/20 0.44
GPR35 Q9HC97 2/20 0.44
HIF1A Q16665 1/20 0.44
CYP1B1 Q16678 1/20 0.44
NQO2 P16083 1/20 0.43
MAPT P10636 2/20 0.42
GAA P10253 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL59671 1.00 HTR2A (0.60) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
Methane SCHEMBL27842569 0.98 HTR2A (0.58) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
Ethane SCHEMBL1070226 0.95 HTR2A (0.56) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
Alcohol SCHEMBL2553967 0.93 HTR2A (0.54) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
Acetic Acid SCHEMBL2222014 0.88 ALDH1A1 (0.52) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
SCHEMBL9064167 0.88 HTR2A (0.48) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
SCHEMBL7938136 0.86 HTR2A (0.47) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
SCHEMBL1073563 0.84 L3MBTL1 (0.50) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
SCHEMBL2397529 0.84 HTR2A (0.46) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10
SCHEMBL2400428 0.84 HTR2A (0.46) HTR2AL3MBTL1ALDH1A1KDM4EHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113316746-B Hologram recording composition, hologram recording medium, hologram, and optical device and optical member using the hologram 索尼集团公司 2024-01-09 CN claimed
US-20260085055-A1 NOVEL MONOMER AND CHEMICALLY RECYCLABLE POLYMER MATERIAL COMPRISING THE SAME KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2026-03-26 US disclosed
CN-119409590-A Fluorescent probe for polymer post-modification, preparation method and application thereof, polymer modified with fluorescent probe and application thereof 复旦大学 2025-02-11 CN disclosed
CN-115179545-B Compositions and articles for additive manufacturing and methods of use thereof 斯特拉塔西斯公司 2024-12-24 CN disclosed
CN-118894880-A Preparation method of siloxane containing chromophore 上海彤程电子材料有限公司 2024-11-05 CN disclosed
EP-4416553-A1 HIGH REFRACTIVE INDEX PHOTORESIST COMPOSITION Dow Silicones Corporation (US) 2024-08-21 EP disclosed
CN-118103773-A High refractive index photoresist composition 美国陶氏有机硅公司 2024-05-28 CN disclosed
CN-117783073-A Quick detection method for selenium content 肇庆宝杰富硒科技有限公司 2024-03-29 CN disclosed
CN-113316746-B Hologram recording composition, hologram recording medium, hologram, and optical device and optical member using the hologram 索尼集团公司 2024-01-09 CN disclosed
CN-116981710-A Epoxy resin composition and epoxy resin cured product 综研化学株式会社 2023-10-31 CN disclosed
CN-111526977-B Compositions and articles for additive manufacturing and methods of use thereof 科思创(荷兰)有限公司 2022-07-01 CN disclosed
CN-110032042-B Negative photoresist composition for laser ablation and method of use thereof 默克专利有限公司 2022-05-27 CN disclosed
CN-113337238-B High-strength light reversible adhesive, preparation method and application 北京化工大学 2022-05-17 CN disclosed
CN-108778688-B Radiation curable compositions for additive fabrication having improved toughness and high temperature resistance 科思创(荷兰)有限公司 2022-05-13 CN disclosed
CN-114341732-A Liquid hybrid uv/vis radiation curable resin compositions for additive manufacturing 科思创(荷兰)有限公司 2022-04-12 CN disclosed
EP-3973357-A1 A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SOLUBLE RESIN AND A PHOTO ACID GENERATOR, AND A METHOD FOR MANUFACTURING METAL FILM PATTERNS ON A SUBSTRATE Merck Patent GmbH (DE) 2022-03-30 EP disclosed
CN-108027558-B Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication 科思创(荷兰)有限公司 2022-03-25 CN disclosed
WO-2022050278-A1 CURABLE RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, SEMICONDUCTOR DEVICE, AND PHOTOBASE GENERATOR 富士フイルム株式会社 2022-03-10 WO disclosed
CN-108883983-B Intermediate film for laminated glass 株式会社可乐丽 2022-02-01 CN disclosed
CN-109503761-B Stable matrix-filled liquid radiation curable resin compositions for additive fabrication 科思创(荷兰)有限公司 2022-02-01 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260085055-A1 NOVEL MONOMER AND CHEMICALLY RECYCLABLE POLYMER MATERIAL COMPRISING THE SAME MACF1, BRD7, BRD1 HTR2A 1554/4885L3MBTL1 2602/4885ALDH1A1 101/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.