SCHEMBL2222086

SCHEMBL2222086

COCc1ccc2ccccc2c1O

nearest known ligand 0.65

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PTPN22 Q9Y2R2 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26257708 0.81 MAPT (0.52)
SCHEMBL27590138 0.80 MAPT (0.49) PTPN22
SCHEMBL2168306 0.80 ALDH1A1 (0.47) PTPN22
SCHEMBL9749140 0.80
SCHEMBL14591514 0.79 TSHR (0.50)
SCHEMBL736665 0.79 HSD17B10 (0.41)
SCHEMBL29886792 0.79
SCHEMBL2167788 0.79
SCHEMBL6010301 0.78
SCHEMBL130289 0.78 PTPN22 (0.58) PTPN22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed