SCHEMBL2229655

SCHEMBL2229655

CC[N+](C)(CC)CC.COC(=O)[O-]

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BBOX1 O75936 5/20 0.46
TSHR P16473 2/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
CHRM4 P08173 2/20 0.32
CHRM1 P11229 2/20 0.32
CHRM3 P20309 2/20 0.32
CHRM2 P08172 1/20 0.32
CHRM5 P08912 1/20 0.32
CYP2D6 P10635 1/20 0.32
CHRNB2 P17787 1/20 0.32
NFKB1 P19838 1/20 0.32
MAPK1 P28482 1/20 0.32
CHRNA7 P36544 1/20 0.32
CHRNA4 P43681 1/20 0.32
FFAR3 O14843 2/20 0.32
HDAC3 O15379 2/20 0.32
HDAC1 Q13547 2/20 0.32
HDAC2 Q92769 2/20 0.32
HDAC8 Q9BY41 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10410042 0.86 BBOX1 (0.38) BBOX1TSHRMEN1KMT2ACHRM4
SCHEMBL10641701 0.84 BBOX1 (0.46) BBOX1TSHRCHRM4CHRM1CHRM3
SCHEMBL11125459 0.83 BBOX1 (0.42) BBOX1TSHRMEN1KMT2ANFKB1
Bicarbonate SCHEMBL557717 0.83 BBOX1 (0.54) BBOX1TSHRNFKB1FFAR3HDAC3
SCHEMBL29201377 0.83 BBOX1 (0.47) BBOX1KMT2ACHRM4CHRM1CHRM3
Tetrylammonium SCHEMBL7572283 0.81 TSHR (0.44) BBOX1TSHRNFKB1FFAR3HDAC3
SCHEMBL28166095 0.81 BBOX1 (0.38) BBOX1TSHRMEN1KMT2ACHRM4
Acetic Acid SCHEMBL557337 0.80 BBOX1 (0.52) BBOX1FFAR3HDAC3HDAC1HDAC2
Bicarbonate SCHEMBL8995782 0.80 BBOX1 (0.52) BBOX1TSHRNFKB1FFAR3HDAC3
Bicarbonate SCHEMBL557719 0.80 BBOX1 (0.52) BBOX1TSHRCHRM4CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3275039-B1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF CORP (US) 2025-08-27 EP claimed
CN-107710462-B Electrochemical hydrogen storage electrode and battery 巴斯夫公司 2022-08-02 CN claimed
CN-107615556-B Electrolyte and metal hydride battery 巴斯夫公司 2021-11-02 CN claimed
CN-107004912-B Electrolyte and metal hydride battery 巴斯夫公司 2021-07-30 CN claimed
EP-3292578-B1 ELECTROCHEMICAL HYDROGEN STORAGE ELECTRODES AND CELLS BASF CORP (US) 2021-02-24 EP claimed
US-10587012-B2 Electrolyte compositions comprising ionic liquids and metal hydride batteries comprising same BASF CORPORATION (US) 2020-03-10 US claimed
US-10243240-B2 Electrolytes and metal hydride batteries BASF CORPORATION (US) 2019-03-26 US claimed
EP-3275039-A1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF Corporation (US) 2018-01-31 EP claimed
EP-3218955-A1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF Corporation (US) 2017-09-20 EP claimed
CN-104592164-B A kind of preparation method of ionic liquid 微宏动力系统(湖州)有限公司 2017-08-29 CN claimed
CN-107004912-A Electrolyte and metal hydride battery 巴斯夫公司 2017-08-01 CN claimed
US-20160365228-A1 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE LAM RESEARCH CORPORATION 2016-12-15 US claimed
US-20160329560-A1 Electrochemical Hydrogen Storage Electrodes and Cells BASF CORPORATION (US) 2016-11-10 US claimed
US-20160285130-A1 Electrolytes and Metal Hydride Batteries U.S. DEPARTMENT OF ENERGY 2016-09-29 US claimed
US-9449797-B2 Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RESEARCH CORPORATION (US) 2016-09-20 US claimed
US-20160141726-A1 Electrolytes and Metal Hydride Batteries BASF CORPORATION 2016-05-19 US claimed
US-20160141727-A1 Electrolytes and Metal Hydride Batteries BASF CORPORATION 2016-05-19 US claimed
CN-104592164-A Preparation method for ionic liquid MICROVAST POWER SYSTEMS CO LTD 2015-05-06 CN claimed
US-20140335698-A1 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE LAM RESEARCH CORPORATION (US) 2014-11-13 US claimed
CN-104143494-A Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RES CORP 2014-11-12 CN claimed