⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2231469 | 0.91 | HTR1A (0.30) | — | |
| SCHEMBL2231124 | 0.85 | PRCP (0.32) | — | |
| SCHEMBL2233689 | 0.82 | — | — | |
| SCHEMBL2232747 | 0.82 | — | — | |
| SCHEMBL2230775 | 0.77 | ALDH1A1 (0.31) | — | |
| SCHEMBL2230777 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL6345278 | 0.76 | HTR2A (0.32) | — | |
| SCHEMBL6343794 | 0.75 | HTR2A (0.33) | — | |
| SCHEMBL8419247 | 0.74 | HTR2A (0.33) | — | |
| SCHEMBL2230740 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8461270-B2 | Olefin/aromatic vinyl copolymer, process for production thereof, resin compositions containing the copolymer, and stretched products of the copolymer | IDEMITSU KOSAN CO., LTD. (JP) | 2013-06-11 | — | — | US | disclosed |
| EP-2157108-B1 | OLEFIN/AROMATIC VINYL COPOLYMER, PROCESS FOR PRODUCTION THEREOF, RESIN COMPOSITIONS CONTAINING THE COPOLYMER, AND STRETCHED PRODUCTS OF THE COPOLYMER | IDEMITSU KOSAN CO (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-20110172366-A1 | OLEFIN/AROMATIC VINYL COPOLYMER, PROCESS FOR PRODUCTION THEREOF, RESIN COMPOSITIONS CONTAINING THE COPOLYMER, AND STRETCHED PRODUCTS OF THE COPOLYMER | IDEMITSU KOSAN CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
| EP-2157108-A1 | OLEFIN/AROMATIC VINYL COPOLYMER, PROCESS FOR PRODUCTION THEREOF, RESIN COMPOSITIONS CONTAINING THE COPOLYMER, AND STRETCHED PRODUCTS OF THE COPOLYMER | Idemitsu Kosan Co., Ltd. (JP) | 2010-02-24 | — | — | EP | disclosed |