SCHEMBL2232111

SCHEMBL2232111

Cc1cccc(C(N)c2ccccc2)c1C

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SCN4A P35499 5/20 0.43
ACP3 P15309 1/20 0.41
DPP4 P27487 2/20 0.39
F2 P00734 1/20 0.39
ADRA2A P08913 3/20 0.38
ADRA2B P18089 3/20 0.38
ADRA2C P18825 3/20 0.38
ADRA1A P35348 3/20 0.38
ADRA1B P35368 3/20 0.38
ADRA1D P25100 2/20 0.38
KCNH2 Q12809 1/20 0.38
TP53 P04637 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
TSHR P16473 1/20 0.38
CYP2C19 P33261 1/20 0.38
ESR1 P03372 1/20 0.38
SLC6A2 P23975 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL6122970 0.98 SCN4A (0.42) SCN4AACP3DPP4F2ADRA2A
Hydrochloric Acid SCHEMBL2232058 0.98 SCN4A (0.42) SCN4AACP3DPP4F2ADRA2A
Water SCHEMBL11461116 0.98 SCN4A (0.42) SCN4AACP3DPP4F2ADRA2A
SCHEMBL3994648 0.85 ACP3 (0.48) SCN4AACP3DPP4F2ADRA2A
SCHEMBL20241459 0.85 ACP3 (0.48) SCN4AACP3DPP4F2ADRA2A
SCHEMBL10580767 0.85 ADRA2A (0.43) SCN4AADRA2AADRA2BADRA2CADRA1A
SCHEMBL16130866 0.84 DPP4 (0.39) SCN4ADPP4F2ADRA2AADRA2C
Hydrochloric Acid SCHEMBL7646260 0.83 ACP3 (0.47) SCN4AACP3DPP4F2ADRA2A
Water SCHEMBL3190745 0.82 DPP4 (0.38) SCN4ADPP4F2ADRA2AADRA2C
SCHEMBL8868744 0.82 CYP3A4 (0.37) SCN4AADRA2AADRA2BADRA2CADRA1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115677948-A High specific gravity transparent resin composition and method for producing particles thereof 广东热浪新材料科技有限公司 2023-02-03 CN claimed
JP-2009544793-A 2009-12-17 JP claimed
EP-2049594-A1 METHOD OF PREPARING RESIN COMPOSITION FOR ARTIFICIAL MARBLE CHIP HAVING HIGH SPECIFIC GRAVITY AND HIGH INDEX OF REFRACTION Cheil Industries Inc. (KR) 2009-04-22 EP claimed
WO-2008013346-A1 METHOD OF PREPARING RESIN COMPOSITION FOR ARTIFICIAL MARBLE CHIP HAVING HIGH SPECIFIC GRAVITY AND HIGH INDEX OF REFRACTION CHEIL INDUSTRIES INC. (KR) 2008-01-31 WO claimed
CN-115677948-A High specific gravity transparent resin composition and method for producing particles thereof 广东热浪新材料科技有限公司 2023-02-03 CN disclosed
EP-2049594-B1 METHOD OF PREPARING RESIN COMPOSITION FOR ARTIFICIAL MARBLE CHIP HAVING HIGH SPECIFIC GRAVITY AND HIGH INDEX OF REFRACTION CHEIL IND INC (KR) 2014-10-08 EP disclosed
US-7981948-B2 Artificial stone and associated methods CHEIL INDUSTRIES, INC. (KR) 2011-07-19 US disclosed
US-20090203818-A1 Artificial stone and associated methods LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2009-08-13 US disclosed
EP-2049594-A1 METHOD OF PREPARING RESIN COMPOSITION FOR ARTIFICIAL MARBLE CHIP HAVING HIGH SPECIFIC GRAVITY AND HIGH INDEX OF REFRACTION Cheil Industries Inc. (KR) 2009-04-22 EP disclosed
WO-2008013346-A1 METHOD OF PREPARING RESIN COMPOSITION FOR ARTIFICIAL MARBLE CHIP HAVING HIGH SPECIFIC GRAVITY AND HIGH INDEX OF REFRACTION CHEIL INDUSTRIES INC. (KR) 2008-01-31 WO disclosed
US-4145341-A WATER-SOLUBLE AZO DYES CONTAINING DIAMINOPYRIMIDINE COUPLER COMPONENTS BASF AKTIENGESELLSCHAFT (DE) 1979-03-20 US disclosed