⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5606250 | 1.00 | — | — | |
| SCHEMBL28004231 | 0.98 | MAPT (0.43) | — | |
| SCHEMBL28323505 | 0.91 | FASN (0.42) | — | |
| SCHEMBL14161541 | 0.87 | ALDH1A1 (0.59) | — | |
| SCHEMBL11000998 | 0.86 | FASN (0.52) | — | |
| SCHEMBL11001012 | 0.86 | FASN (0.52) | — | |
| SCHEMBL28713632 | 0.84 | FASN (0.60) | — | |
| SCHEMBL634762 | 0.84 | FASN (0.60) | — | |
| SCHEMBL634763 | 0.84 | FASN (0.60) | — | |
| SCHEMBL11580318 | 0.84 | ALDH1A1 (0.52) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4689041-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| WO-2024206302-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-10-03 | — | — | WO | claimed |
| US-20240327761-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-10-03 | — | — | US | claimed |
| US-11603512-B2 | Cleaning compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2023-03-14 | — | — | US | claimed |
| EP-4121224-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2023-01-25 | — | — | EP | claimed |
| CN-115397572-A | Cleaning compositions and methods of use thereof | 富士胶片电子材料美国有限公司 | 2022-11-25 | — | — | CN | claimed |
| WO-2021188766-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-09-23 | — | — | WO | claimed |
| US-20210292685-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-09-23 | — | — | US | claimed |
| US-20260108600-A1 | METHODS AND COMPOSITIONS RELATING TO IMPROVED IONIC LIQUID ADJUVANTS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2026-04-23 | — | — | US | disclosed |
| EP-4689041-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2026-02-11 | — | — | EP | disclosed |
| US-20250257286-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-08-14 | — | — | US | disclosed |
| WO-2024206302-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-10-03 | — | — | WO | disclosed |
| US-20240327761-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-10-03 | — | — | US | disclosed |
| US-20240117270-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-04-11 | — | — | US | disclosed |
| US-20060252961-A1 | triethylammonium (4-chlorophenylsulfonyl)difluoromethanesulfonate used for acid catalysts, ion exchange membranes | DAIKIN INDUSTRIES, LTD. (JP) | 2006-11-09 | — | — | US | disclosed |
| CN-1220676-C | Method for producing acid anhydride | TOKUYAMA CORP (JP) | 2005-09-28 | — | — | CN | disclosed |
| US-20040242929-A1 | Process for production of acid anhydride | TOKUYAMA CORPORATION (JP) | 2004-12-02 | — | — | US | disclosed |
| CN-1537097-A | Method for producing acid anhydride | ��ʽ�����ɽ | 2004-10-13 | — | — | CN | disclosed |
| EP-1413572-A1 | PROCESS FOR PRODUCING ACID ANHYDRIDE | Tokuyama Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-4131743-A | Process for preparing unsaturated diesters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1978-12-26 | — | — | US | disclosed |