⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19057872 | 0.84 | ALDH1A1 (0.35) | — | |
| SCHEMBL13079568 | 0.81 | HSD11B1 (0.32) | — | |
| SCHEMBL11991287 | 0.80 | CYP17A1 (0.38) | — | |
| SCHEMBL19986155 | 0.80 | — | — | |
| SCHEMBL20799737 | 0.79 | — | — | |
| SCHEMBL21577899 | 0.77 | — | — | |
| SCHEMBL21298725 | 0.77 | — | — | |
| SCHEMBL19049860 | 0.77 | MEN1 (0.31) | — | |
| SCHEMBL18475093 | 0.76 | — | — | |
| SCHEMBL18711192 | 0.75 | NPSR1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023100574-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND | JSR株式会社 | 2023-06-08 | — | — | WO | disclosed |
| US-10754248-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-25 | — | — | US | disclosed |