SCHEMBL22402767

SCHEMBL22402767

CS(C)(C)C1c2ccccc2-c2ccccc2C1S(C)(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 2/20 0.46
HTR2A P28223 1/20 0.41
POLB P06746 2/20 0.39
ACHE P22303 3/20 0.38
CHRM2 P08172 1/20 0.38
HTR1A P08908 1/20 0.38
ADRA2A P08913 1/20 0.38
CHRM1 P11229 1/20 0.38
DRD1 P21728 1/20 0.38
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38
ADRA1A P35348 1/20 0.38
OPRM1 P35372 1/20 0.38
DRD3 P35462 1/20 0.38
SLC6A3 Q01959 1/20 0.38
HRH3 Q9Y5N1 1/20 0.38
KMT2A Q03164 3/20 0.36
BCHE P06276 2/20 0.36
MEN1 O00255 2/20 0.36
SLC22A2 O15244 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19042320 0.79 GPR3 (0.46) GPR3HTR2APOLBACHECHRM2
SCHEMBL20968147 0.74 GPR3 (0.46) GPR3HTR2APOLBACHECHRM2
SCHEMBL22402750 0.74 GPR3 (0.31) GPR3
SCHEMBL17308141 0.70 GPR3 (0.43) GPR3HTR2APOLBACHECHRM2
SCHEMBL22402770 0.69 GPR3 (0.35) GPR3ACHEKMT2AMEN1
SCHEMBL29641604 0.69 GPR3 (0.52) GPR3HTR2APOLBACHECHRM2
SCHEMBL29469331 0.69 GPR3 (0.46) GPR3HTR2APOLBKMT2AMEN1
SCHEMBL40599 0.69 GPR3 (0.52) GPR3HTR2APOLBACHECHRM2
SCHEMBL6903531 0.69 GPR3 (0.46) GPR3HTR2APOLBKMT2AMEN1
SCHEMBL29469332 0.69 GPR3 (0.46) GPR3HTR2APOLBKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11230764-B2 Methods of atomic layer deposition for selective film growth MERCK PATENT GMBH (DE) 2022-01-25 US disclosed
US-20200283894-A1 Methods Of Atomic Layer Deposition For Selective Film Growth MERCK PATENT GMBH (DE) 2020-09-10 US disclosed