SCHEMBL22790007

SCHEMBL22790007

CS(=O)(=O)NC(=O)C1CCC(OC(O)c2cc(I)cc(I)c2I)CC1

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ ACACB O00763 1/20 0.34
▸ DEGS1 O15121 1/20 0.33
▸ SCN9A Q15858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097512 0.77 ACACB (0.33) ACACBSCN9A
SCHEMBL22403233 0.76 SCN9A (0.31) SCN9A
SCHEMBL22097556 0.72 ACACB (0.36) ACACBSCN9A
SCHEMBL22097478 0.67 SERPINE1 (0.33) SCN9A
SCHEMBL25479241 0.67 VCP (0.35) ACACBSCN9A
SCHEMBL4110765 0.67 POLB (0.36) —
SCHEMBL22403150 0.66 TTR (0.34) —
SCHEMBL26343818 0.64 VCP (0.35) —
SCHEMBL25479340 0.62 — —
SCHEMBL22097561 0.61 PCNA (0.32) SCN9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20200393760-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-17 — — US disclosed
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