Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL535313 | 0.98 | TOP2A (0.42) | TOP2ATOP2B | |
| Hydrochloric Acid SCHEMBL16262503 | 0.98 | TOP2A (0.42) | TOP2ATOP2B | |
| Hydrochloric Acid SCHEMBL28347496 | 0.98 | TOP2A (0.42) | TOP2ATOP2B | |
| SCHEMBL18298166 | 0.87 | TOP2A (0.39) | TOP2ATOP2B | |
| SCHEMBL28356386 | 0.82 | TOP2A (0.36) | TOP2ATOP2B | |
| SCHEMBL5496734 | 0.81 | TOP2A (0.35) | TOP2ATOP2B | |
| SCHEMBL5496738 | 0.81 | TOP2A (0.35) | TOP2ATOP2B | |
| Hydrochloric Acid SCHEMBL818510 | 0.80 | TOP2A (0.38) | TOP2ATOP2B | |
| Hydrochloric Acid SCHEMBL29829553 | 0.80 | TOP2A (0.38) | TOP2ATOP2B | |
| SCHEMBL9659510 | 0.78 | TOP2A (0.38) | TOP2ATOP2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2459607-B1 | HYBRID COPOLYMER COMPOSITIONS FOR PERSONAL CARE APPLICATIONS | NOURYON CHEMICALS INT BV (NL) | 2021-04-14 | — | — | EP | claimed |
| US-9340498-B2 | Raft polymerisation | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESERACH ORGANISATION (AU) | 2016-05-17 | — | — | US | claimed |
| US-12516143-B2 | Polystyrene-based polyampholyte having upper critical solution temperature, and application for same | TOSOH FINECHEM CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20250222433-A1 | METHOD FOR PRODUCING WATER-ABSORBING RESIN COMPOSITION | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2025-07-10 | — | — | US | disclosed |
| WO-2025126867-A1 | WATER ABSORBENT RESIN PARTICLES, WATER ABSORBENT BODY, WATER ABSORBENT ARTICLE, AND METHOD FOR PRODUCING WATER ABSORBENT RESIN PARTICLES | 住友精化株式会社 | 2025-06-19 | — | — | WO | disclosed |
| WO-2025070255-A1 | METHOD FOR PRODUCING WATER ABSORBENT RESIN PARTICLES, AND METHOD FOR CONTROLLING PARTICLE DIAMETERS OF WATER ABSORBENT RESIN PARTICLES | 住友精化株式会社 | 2025-04-03 | — | — | WO | disclosed |
| WO-2025013729-A1 | METHOD FOR PRODUCING WATER-ABSORBENT RESIN PARTICLES, WATER-ABSORBING RESIN PARTICLES, ABSORBER, AND ABSORBENT ARTICLE | 住友精化株式会社 | 2025-01-16 | — | — | WO | disclosed |
| WO-2025013730-A1 | METHOD FOR PRODUCING WATER ABSORBENT RESIN PARTICLES, WATER ABSORBENT RESIN PARTICLES, ABSORBER, AND ABSORBENT ARTICLE | 住友精化株式会社 | 2025-01-16 | — | — | WO | disclosed |
| WO-2024204234-A1 | RESIN COMPOSITION, LIQUID CRYSTAL SEALANT, AND LIQUID CRYSTAL DISPLAY PANEL USING SAME | 三井化学株式会社 | 2024-10-03 | — | — | WO | disclosed |
| EP-3896120-B1 | WATER-ABSORBING RESIN PARTICLES, ABSORBENT, AND ABSORBENT ARTICLE | SUMITOMO SEIKA CHEMICALS (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-20240123426-A1 | METHOD FOR PRODUCING WATER ABSORBENT RESIN PARTICLES | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2024-04-18 | — | — | US | disclosed |
| WO-2004089994-A1 | REMOVAL OF THIOCARBONYL END GROUPS OF POLYMERS | SYMYX TECHNOLOGIES, INC. (US) | 2004-10-21 | — | — | WO | disclosed |
| EP-0519439-B1 | Binders for diazo resins | FUJI PHOTO FILM CO LTD (JP) | 1997-12-03 | — | — | EP | disclosed |
| EP-0398373-B1 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 1996-02-21 | — | — | EP | disclosed |
| EP-0389928-B1 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 1995-08-02 | — | — | EP | disclosed |
| US-5346975-A | For wear resistant lithographic printing plates; photocrosslinkable; from maleimido group containing macromer | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-5314954-A | Process for preparing aromatic polyester-polystyrene block copolymers | UNITIKA LTD. (JP) | 1994-05-24 | — | — | US | disclosed |
| US-5300397-A | Enhanced sensitivity | FUJI PHOTO FILM CO., LTD. (JP) | 1994-04-05 | — | — | US | disclosed |
| US-5256735-A | Solution polymerization of styrene polymers having terminal functional groups reactive with acid halide or hydroxyl groups, and aromatic dicarboxylic acid dihalides | NIPPON STEEL CORPORATION (JP) | 1993-10-26 | — | — | US | disclosed |
| EP-0519439-A2 | Binders for diazo resins | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-23 | — | — | EP | disclosed |