SCHEMBL22461350

SCHEMBL22461350

C=CC(=O)N1CCC(C(=O)OCC(C)C)CC1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.46
TSHR P16473 1/20 0.45
SMN1; SMN2 Q16637 4/20 0.42
NPC1 O15118 3/20 0.42
RAB9A P51151 3/20 0.42
ALDH1A1 P00352 5/20 0.41
GAA P10253 3/20 0.40
HRH3 Q9Y5N1 1/20 0.39
KDM4E B2RXH2 3/20 0.39
HPGD P15428 1/20 0.39
TEAD1 P28347 3/20 0.39
TEAD3 Q99594 1/20 0.39
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23420219 0.92 TSHR (0.42) MAPTTSHRSMN1; SMN2NPC1RAB9A
SCHEMBL23421015 0.85 TSHR (0.47) MAPTTSHRSMN1; SMN2NPC1RAB9A
SCHEMBL22461531 0.83 ALDH1A1 (0.46) MAPTTSHRSMN1; SMN2NPC1RAB9A
SCHEMBL6499004 0.83 MAPT (0.62) MAPTTSHRSMN1; SMN2NPC1RAB9A
SCHEMBL22461353 0.81 MAPT (0.48) MAPTSMN1; SMN2NPC1RAB9AALDH1A1
SCHEMBL22461356 0.80 HRH3 (0.41) MAPTSMN1; SMN2NPC1RAB9AALDH1A1
SCHEMBL1579798 0.80 MAPT (0.49) MAPTSMN1; SMN2RAB9AALDH1A1GAA
SCHEMBL22461352 0.79 TSHR (0.54) MAPTTSHRSMN1; SMN2NPC1RAB9A
SCHEMBL22461354 0.78 TSHR (0.46) MAPTTSHRSMN1; SMN2NPC1RAB9A
SCHEMBL24131502 0.78 MAPT (0.45) MAPTTSHRRAB9AALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230135413-A1 CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED INK, STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED BODY RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
US-20230135413-A1 CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED INK, STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED BODY RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
US-20210155814-A1 ACTIVE-ENERGY-RAY-CURABLE AQUEOUS COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE AQUEOUS INK, STORED CONTAINER, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED PRODUCT RICOH COMPANY, LTD. (JP) 2021-05-27 US disclosed
US-20210061929-A1 ACTIVE-ENERGY-RAY-CURABLE COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INK, COMPOSITION STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD AND APPARATUS, CURED PRODUCT, AND DECORATED PRODUCT RICOH COMPANY, LTD. (JP) 2021-03-04 US disclosed
US-20200299425-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION, ACTIVE ENERGY RAY CURABLE INK, COMPOSITION ACCOMMODATING CONTAINER, TWO OR THREE DIMENSIONAL IMAGE FORMING APPARATUS, TWO OR THREE DIMENSIONAL IMAGE FORMING METHOD, CURED MATTER, DECORATIVE MATTER, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATIVE MATERIAL, AND ARTIFICIAL NAIL RICOH COMPANY, LTD. (JP) 2020-09-24 US disclosed