SCHEMBL22461352

SCHEMBL22461352

C=CC(=O)N1CCC(C(=O)OCC(CC)CCCC)CC1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.54
CYP3A4 P08684 3/20 0.44
TDP1 Q9NUW8 2/20 0.44
ATM Q13315 1/20 0.44
ALDH1A1 P00352 6/20 0.40
CA2 P00918 1/20 0.40
MAPT P10636 2/20 0.39
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
RECQL P46063 1/20 0.38
KDM4E B2RXH2 3/20 0.37
GAA P10253 1/20 0.37
LMNA P02545 2/20 0.37
MAPK1 P28482 1/20 0.36
HSD17B10 Q99714 1/20 0.36
HPGD P15428 1/20 0.36
PRSS1 P07477 1/20 0.36
PRSS2 P07478 1/20 0.36
PRSS3 P35030 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23420220 0.94 TSHR (0.53) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL23420720 0.89 TSHR (0.58) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL22461528 0.87 TSHR (0.51) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL1296760 0.82 CYP3A4 (0.58) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL10523965 0.82 CYP3A4 (0.58) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL22461354 0.81 TSHR (0.46) TSHRCYP3A4ALDH1A1MAPTNPC1
SCHEMBL22461350 0.79 MAPT (0.46) TSHRCYP3A4ALDH1A1MAPTNPC1
SCHEMBL9000874 0.79 CYP3A4 (0.55) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL23420009 0.79 TSHR (0.52) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL23420313 0.79 TSHR (0.58) TSHRCYP3A4TDP1ATMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230135413-A1 CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED INK, STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED BODY RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
US-20230135413-A1 CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED INK, STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED BODY RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
US-20210155814-A1 ACTIVE-ENERGY-RAY-CURABLE AQUEOUS COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE AQUEOUS INK, STORED CONTAINER, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED PRODUCT RICOH COMPANY, LTD. (JP) 2021-05-27 US disclosed
US-20210061929-A1 ACTIVE-ENERGY-RAY-CURABLE COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INK, COMPOSITION STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD AND APPARATUS, CURED PRODUCT, AND DECORATED PRODUCT RICOH COMPANY, LTD. (JP) 2021-03-04 US disclosed
US-20200299425-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION, ACTIVE ENERGY RAY CURABLE INK, COMPOSITION ACCOMMODATING CONTAINER, TWO OR THREE DIMENSIONAL IMAGE FORMING APPARATUS, TWO OR THREE DIMENSIONAL IMAGE FORMING METHOD, CURED MATTER, DECORATIVE MATTER, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATIVE MATERIAL, AND ARTIFICIAL NAIL RICOH COMPANY, LTD. (JP) 2020-09-24 US disclosed