⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbamic Acid SCHEMBL11526752 | 0.86 | ACHE (0.64) | — | |
| Carbamic Acid SCHEMBL722333 | 0.86 | — | — | |
| Ethylene Glycol SCHEMBL29030002 | 0.86 | TSHR (0.46) | — | |
| Acetamide SCHEMBL4193803 | 0.82 | — | — | |
| 1,4-Butanediol SCHEMBL18154515 | 0.82 | LMNA (0.50) | — | |
| Urea SCHEMBL2597672 | 0.82 | — | — | |
| Carbamic Acid SCHEMBL4454556 | 0.79 | ACHE (0.54) | — | |
| Urea SCHEMBL514134 | 0.79 | — | — | |
| Urea SCHEMBL8434002 | 0.78 | LMNA (1.00) | — | |
| Urea SCHEMBL20641124 | 0.78 | LMNA (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 148 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118244583-A | Negative photosensitive polyimide precursor resin composition | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-118240213-A | Negative photosensitive polyimide precursor and composition thereof | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-117038353-A | Preparation method of nitrogen-doped carbon-coated cobalt-nickel sulfide nanosheet positive electrode material for supercapacitor | 电子科技大学长三角研究院(湖州) | 2023-11-10 | — | — | CN | claimed |
| CN-116789965-A | Polyimide precursor, photoresist composition and application thereof | 常州力得尔电子新材料有限公司 | 2023-09-22 | — | — | CN | claimed |
| CN-116794930-A | Negative polyimide photoresist, method for preparing concave-convex pattern and semiconductor device | 常州力得尔电子新材料有限公司 | 2023-09-22 | — | — | CN | claimed |
| US-20230131253-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-27 | — | — | US | claimed |
| US-7595143-B2 | Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion; photomasks, photoresists | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-29 | — | — | US | claimed |
| US-20070048662-A1 | Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion; photomasks, photoresists | SAMSUNG ELECTRONICS CO., LTD. | 2007-03-01 | — | — | US | claimed |
| US-6524781-B2 | Mixture of photosensitive silve rhalide emulsion, organic silver compound and reducing agent; controlling odors | KONICA CORPORATION (JP) | 2003-02-25 | — | — | US | claimed |
| US-20020012888-A1 | Photothermographic material | KONICA CORPORATION, A CORPORATION OF JAPAN (JP) | 2002-01-31 | — | — | US | claimed |
| US-5939134-A | Process for making a thin film magnetic head | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-08-17 | — | — | US | claimed |
| US-5702756-A | Process for making a thin film magnetic head | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1997-12-30 | — | — | US | claimed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-118244583-A | Negative photosensitive polyimide precursor resin composition | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | disclosed |
| CN-118240213-A | Negative photosensitive polyimide precursor and composition thereof | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | disclosed |
| CN-118126159-A | Green and efficient preparation method of swimming bladder collagen | 中国农业大学 | 2024-06-04 | — | — | CN | disclosed |
| US-4485032-A | WITH ETHYLENE GLYCOL, UREA OR SUBSTITUTED UREA; STORAGE STABILITY | THE DOW CHEMICAL COMPANY (US) | 1984-11-27 | — | — | US | disclosed |
| EP-0036252-A2 | Textile printing process | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1981-09-23 | — | — | EP | disclosed |
| US-4191804-A | CONDENSATE OF A SILANETRIOL, AMINO RESIN | TECHSIGHT CORP. (US) | 1980-03-04 | — | — | US | disclosed |
| US-4131581-A | Adhesive compositions consisting essentially of a vinyl alcohol polymer, a crystalline solvent and a viscosity reducing diluent | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-12-26 | — | — | US | disclosed |