SCHEMBL2249361

SCHEMBL2249361

CCCCCCCCCCC(O)CP(=O)(O)O

nearest known ligand 0.62

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
FDPS P14324 4/20 0.61
LAP3 P28838 2/20 0.57
GPR84 Q9NQS5 4/20 0.52
S1PR2 O95136 5/20 0.52
S1PR1 P21453 5/20 0.52
S1PR3 Q99500 5/20 0.52
S1PR4 O95977 4/20 0.52
SMPD1 P17405 2/20 0.50
LPAR2 Q9HBW0 1/20 0.50
LPAR3 Q9UBY5 1/20 0.50
FFAR4 Q5NUL3 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2252026 1.00 FDPS (0.61) FDPSLAP3GPR84S1PR2S1PR1
SCHEMBL2254767 1.00 FDPS (0.61) FDPSLAP3GPR84S1PR2S1PR1
SCHEMBL2251272 1.00 FDPS (0.61) FDPSLAP3GPR84S1PR2S1PR1
SCHEMBL2254316 1.00 FDPS (0.61) FDPSLAP3GPR84S1PR2S1PR1
SCHEMBL2255136 1.00 FDPS (0.61) FDPSLAP3GPR84S1PR2S1PR1
SCHEMBL2250975 1.00 FDPS (0.61) FDPSLAP3GPR84S1PR2S1PR1
Phosphoric Acid SCHEMBL28408621 0.85 FDPS (0.68) FDPSLAP3GPR84SMPD1FFAR4
SCHEMBL10933695 0.83 GPR84 (0.52) FDPSLAP3GPR84SMPD1FFAR4
SCHEMBL10934386 0.83 GPR84 (0.52) FDPSLAP3GPR84SMPD1FFAR4
SCHEMBL825875 0.83 GPR84 (0.52) FDPSLAP3GPR84SMPD1FFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11993094-B2 Reversible recording medium and exterior member SONY CORPORATION (JP) 2024-05-28 US disclosed
US-20240165983-A1 DRAWING SYSTEM AND DRAWING METHOD Sony Group Corporation (JP) 2024-05-23 US disclosed
EP-4316859-A1 DRAWING SYSTEM AND DRAWING METHOD Sony Group Corporation (JP) 2024-02-07 EP disclosed
US-11865853-B2 Thermosensitive recording medium and exterior member SONY CORPORATION (JP) 2024-01-09 US disclosed
CN-117042976-A Drawing system and drawing method 索尼集团公司 2023-11-10 CN disclosed
WO-2023176942-A1 DRAWN OBJECT AND METHOD FOR FORMING DRAWN OBJECT ソニーグループ株式会社 2023-09-21 WO disclosed
EP-3812159-B1 DRAWING AND ERASING DEVICE AND ERASING METHOD SONY GROUP CORP (JP) 2023-07-26 EP disclosed
US-11667142-B2 Reversible recording medium and exterior member SONY CORPORATION (JP) 2023-06-06 US disclosed
CN-112638653-B Drawing method, thermosensitive recording medium, and drawing apparatus 索尼公司 2023-02-17 CN disclosed
CN-111511563-B Drawing method, erasing method, and drawing apparatus 索尼公司 2023-01-10 CN disclosed
EP-2921314-B1 THERMOSENSITIVE RECORDING MEDIUM AND IMAGE PROCESSING DEVICE RICOH CO LTD (JP) 2020-10-21 EP disclosed
EP-3711961-A1 DRAWING METHOD, ERASING METHOD, AND DRAWING DEVICE Sony Corporation (JP) 2020-09-23 EP disclosed
EP-3708381-A1 DRAWING METHOD AND ERASING METHOD Sony Corporation (JP) 2020-09-16 EP disclosed
CN-111511563-A Drawing method, erasing method, and drawing apparatus 索尼公司 2020-08-07 CN disclosed
CN-111511567-A Drawing method and erasing method 索尼公司 2020-08-07 CN disclosed
EP-2921314-A2 Thermosensitive recording medium and image processing method Ricoh Company, Ltd. (JP) 2015-09-23 EP disclosed
US-8598074-B2 Thermosensitive recording medium, image recording method and image processing method RICOH COMPANY, LTD. (JP) 2013-12-03 US disclosed
EP-2361783-A1 thermosensitive recording medium, image recording method and image processing method Ricoh Company, Ltd. (JP) 2011-08-31 EP disclosed
US-20110207603-A1 THERMOSENSITIVE RECORDING MEDIUM, IMAGE RECORDING METHOD AND IMAGE PROCESSING METHOD RICOH COMPANY, LTD. (JP) 2011-08-25 US disclosed
JP-2000218943-A HEAT-SENSITIVE RECORDING MEDIUM RICOH CO LTD 2000-08-08 JP disclosed