Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 4/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | CHEK2 | O96017 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | EZH2 | Q15910 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.35 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29503070 | 0.96 | EPHX2 (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL24634212 | 0.96 | EPHX2 (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL860742 | 0.95 | HPGD (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| Benzoic Acid SCHEMBL29503073 | 0.91 | CES2 (0.40) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL18799991 | 0.90 | HTT (0.39) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL18351278 | 0.90 | HTT (0.39) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL16371669 | 0.85 | ALDH1A1 (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL28883558 | 0.85 | ALDH1A1 (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL17069996 | 0.85 | ALDH1A1 (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A | |
| SCHEMBL16371670 | 0.85 | ALDH1A1 (0.42) | HPGDALDH1A1EPHX2NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111752096-B | Photosensitive resin composition for color filter and color filter | 常州正洁智造科技有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-115128899-A | Photosensitive resin composition with improved system hue stability | 常州正洁智造科技有限公司 | 2022-09-30 | — | — | CN | disclosed |
| CN-111752091-B | Application of HABI mixed photoinitiator in UVLED photocuring | 常州正洁智造科技有限公司 | 2022-09-06 | — | — | CN | disclosed |
| CN-112835261-B | EO/PO modified 9-phenylacridine photosensitizer and application thereof | 常州强力电子新材料股份有限公司 | 2022-06-07 | — | — | CN | disclosed |
| CN-114442425-A | Curable resin composition, solder resist film formed from the same, interlayer insulating material, and printed wiring board | 常州正洁智造科技有限公司 | 2022-05-06 | — | — | CN | disclosed |
| CN-114326299-A | Photosensitive resin composition, optical filter and application | 常州强力电子新材料股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-114326309-A | Photosensitive resin composition and application thereof | 常州正洁智造科技有限公司 | 2022-04-12 | — | — | CN | disclosed |
| WO-2021104224-A1 | EO/PO-MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZER AND APPLICATION THEREOF | 常州强力电子新材料股份有限公司 | 2021-06-03 | — | — | WO | disclosed |
| WO-2020233700-A1 | HABI PHOTOINITIATOR CAPABLE OF IMPROVING SYSTEM STABILITY AND APPLICATION THEREOF | 常州格林感光新材料有限公司 (CN) | 2020-11-26 | — | — | WO | disclosed |
| WO-2020200020-A1 | HEXAARYLBIIMIDAZOLE PHOTOINITIATOR AND APPLICATION THEREOF | 常州格林感光新材料有限公司 | 2020-10-08 | — | — | WO | disclosed |