SCHEMBL22503054

SCHEMBL22503054

O=C(NS(=O)(=O)C(F)(F)F)C1CC2CC1C1CCCC21

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ SCN9A Q15858 2/20 0.33
▸ NPC1 O15118 1/20 0.32
▸ RAB9A P51151 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ SCN5A Q14524 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503257 0.78 — —
SCHEMBL2754963 0.78 — —
SCHEMBL22503053 0.77 — —
SCHEMBL22503240 0.75 POLB (0.41) NPC1RAB9AL3MBTL1
SCHEMBL15866048 0.72 — —
SCHEMBL22503049 0.72 HDAC8 (0.39) L3MBTL1
SCHEMBL13959299 0.71 — —
SCHEMBL22503050 0.71 POLB (0.51) NPC1RAB9AL3MBTL1
SCHEMBL26163050 0.70 ALDH1A1 (0.44) RAB9AL3MBTL1
SCHEMBL22503048 0.70 VCP (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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