SCHEMBL22503161

SCHEMBL22503161

O=C(NS(=O)(=O)C(F)(F)F)c1cccc2ccccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 1/20 0.56
HDAC8 Q9BY41 1/20 0.56
PLK1 P53350 1/20 0.54
MCL1 Q07820 1/20 0.50
DEGS1 O15121 1/20 0.48
NR4A1 P22736 1/20 0.47
NR4A2 P43354 1/20 0.47
NR4A3 Q92570 1/20 0.47
RAB9A P51151 4/20 0.47
NPC1 O15118 3/20 0.47
RXFP1 Q9HBX9 1/20 0.46
HPGD P15428 2/20 0.46
LMNA P02545 1/20 0.46
POLB P06746 1/20 0.46
ALDH1A1 P00352 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
MEN1 O00255 4/20 0.45
KMT2A Q03164 4/20 0.45
PIN1 Q13526 1/20 0.44
GAA P10253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28995902 0.80 MCL1 (0.43) MMP3HDAC8MCL1POLBSMN1; SMN2
SCHEMBL28412577 0.80 HDAC8 (0.62) MMP3HDAC8PLK1DEGS1NR4A1
SCHEMBL26163054 0.79 HPGD (0.61) RAB9ANPC1HPGDLMNAPOLB
SCHEMBL22503203 0.79 ALDH1A1 (0.49) HPGDPOLBALDH1A1SMN1; SMN2MEN1
SCHEMBL22503280 0.79 MCL1 (0.37) MMP3HDAC8PLK1MCL1RAB9A
SCHEMBL22503259 0.78 KMT2A (0.47) HDAC8MCL1HPGDLMNAPOLB
SCHEMBL22503291 0.78 MCL1 (0.45) MCL1HPGDLMNAALDH1A1SMN1; SMN2
SCHEMBL2449148 0.78 HDAC8 (0.51) MMP3HDAC8PLK1DEGS1NR4A1
SCHEMBL22503278 0.78 MCL1 (0.38) PLK1MCL1RXFP1HPGDPOLB
SCHEMBL23014667 0.78 PTGS1 (0.51) RAB9ANPC1HPGDPOLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed