SCHEMBL22503259

SCHEMBL22503259

O=C(NS(=O)(=O)C(F)(F)F)c1c2ccccc2cc2ccccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.47
KDM4E B2RXH2 2/20 0.47
MEN1 O00255 2/20 0.47
ALDH1A1 P00352 2/20 0.47
HPGD P15428 2/20 0.47
CYP1A2 P05177 1/20 0.47
GLA P06280 1/20 0.47
CYP2C19 P33261 1/20 0.47
HSD17B10 Q99714 1/20 0.47
MCL1 Q07820 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.43
CCR2 P41597 1/20 0.43
HDAC1 Q13547 2/20 0.38
HDAC7 Q8WUI4 2/20 0.38
HDAC8 Q9BY41 2/20 0.38
HDAC6 Q9UBN7 2/20 0.38
PTPN1 P18031 1/20 0.38
VCP P55072 1/20 0.38
PIN1 Q13526 1/20 0.37
PTGFR P43088 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28759623 0.80 MCL1 (0.41) KMT2AKDM4EMCL1CCR2HDAC8
SCHEMBL22503161 0.78 MMP3 (0.56) KMT2AMEN1ALDH1A1HPGDMCL1
SCHEMBL22503291 0.78 MCL1 (0.45) KMT2AKDM4EMEN1ALDH1A1HPGD
SCHEMBL28995902 0.77 MCL1 (0.43) KDM4EMCL1CCR2HDAC8PIN1
SCHEMBL26163131 0.74 VCP (0.39) ALDH1A1HPGDMCL1CCR2HDAC8
SCHEMBL22503312 0.73 KMT2A (0.46) KMT2AMEN1HPGDCYP1A2LMNA
SCHEMBL18160600 0.73 PTGS1 (0.56) KDM4ELMNAPOLB
SCHEMBL14703301 0.73 CA2 (0.44) PTPN1
SCHEMBL178335 0.73 HDAC3 (0.52) KMT2AMEN1HSD17B10L3MBTL1HDAC1
SCHEMBL24465360 0.73 MCL1 (0.40) MCL1CCR2HDAC1HDAC7HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed