SCHEMBL22503283

SCHEMBL22503283

COC(=O)C1CCCCC1C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 2/20 0.37
ALDH1A1 P00352 6/20 0.35
TP53 P04637 2/20 0.35
CYP2C19 P33261 2/20 0.35
GAA P10253 1/20 0.35
CYP2D6 P10635 1/20 0.35
SLC6A4 P31645 1/20 0.34
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRM3 P20309 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
MAPK1 P28482 1/20 0.31
RXFP1 Q9HBX9 1/20 0.31
MAPT P10636 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503281 0.86 ALDH1A1 (0.38) ALDH1A1TP53CYP2C19GAACYP2D6
SCHEMBL26163086 0.82 ALDH1A1 (0.31) ALDH1A1TP53CYP2C19GAACYP2D6
SCHEMBL26163050 0.82 ALDH1A1 (0.44) ALDH1A1GAAL3MBTL1SMN1; SMN2MAPT
SCHEMBL26163087 0.81 ALDH1A1 (0.31) ALDH1A1TP53CYP2C19GAACYP2D6
SCHEMBL22503289 0.80 CA1 (0.39) ALDH1A1CYP2C19GAAL3MBTL1SMN1; SMN2
SCHEMBL22503286 0.79 ALDH1A1 (0.34) ALDH1A1TP53CYP2C19GAACYP2D6
SCHEMBL22503215 0.78 TP53 (0.62) ALDH1A1TP53CYP2C19GAACYP2D6
SCHEMBL24452524 0.76 ALDH1A1 (0.38) ALDH1A1TP53CYP2C19GAACYP2D6
SCHEMBL272354 0.75 CHRM2 (0.48) SLC6A2TP53SLC6A4CHRM2CHRM4
SCHEMBL13595131 0.75 CHRM2 (0.48) SLC6A2TP53SLC6A4CHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed