SCHEMBL22503289

SCHEMBL22503289

COC(=O)C1CC=CCC1C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.36
NPSR1 Q6W5P4 3/20 0.35
RXFP1 Q9HBX9 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
POLB P06746 3/20 0.34
ALDH1A1 P00352 4/20 0.33
KDM4E B2RXH2 2/20 0.33
TDP1 Q9NUW8 2/20 0.32
HSD17B10 Q99714 1/20 0.32
CYP1A2 P05177 3/20 0.31
CYP3A4 P08684 3/20 0.31
CYP2C9 P11712 3/20 0.31
CYP2C19 P33261 3/20 0.31
LMNA P02545 2/20 0.31
TSHR P16473 2/20 0.31
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
ALOX12 P18054 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503287 0.83 SMN1; SMN2 (0.46) SMN1; SMN2POLBALDH1A1KDM4ETDP1
SCHEMBL22503283 0.80 SLC6A2 (0.37) CA1CA2L3MBTL1RXFP1SMN1; SMN2
SCHEMBL13198671 0.76 GAA (0.41) NPSR1RXFP1POLBALDH1A1HSD17B10
SCHEMBL9308973 0.76 GAA (0.41) NPSR1RXFP1POLBALDH1A1HSD17B10
SCHEMBL8246813 0.76 GAA (0.41) NPSR1RXFP1POLBALDH1A1HSD17B10
SCHEMBL418070 0.76 GAA (0.41) NPSR1RXFP1POLBALDH1A1HSD17B10
SCHEMBL418068 0.76 GAA (0.41) NPSR1RXFP1POLBALDH1A1HSD17B10
SCHEMBL18785342 0.71 L3MBTL1 (0.39) CA1CA2L3MBTL1POLBCYP1A2
SCHEMBL18785612 0.70 GAA (0.35) CA1CA2NPSR1POLBCYP1A2
SCHEMBL417370 0.69 ALDH1A1 (0.49) NPSR1RXFP1SMN1; SMN2POLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed