SCHEMBL22503293

SCHEMBL22503293

O=C(NS(=O)(=O)C(F)(F)F)c1ccc2c(c1)C(=O)c1ccccc1C2=O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 2/20 0.53
NPC1 O15118 1/20 0.52
RAB9A P51151 1/20 0.52
ATM Q13315 1/20 0.52
PTPRC P08575 6/20 0.49
CTSL P07711 1/20 0.49
PTPN13 Q12923 1/20 0.49
POLB P06746 3/20 0.46
MAPT P10636 3/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
ALDH1A1 P00352 1/20 0.46
PKM P14618 1/20 0.46
HPGD P15428 1/20 0.46
HSD17B10 Q99714 1/20 0.46
TERT O14746 2/20 0.46
ACE2 Q9BYF1 1/20 0.46
GRIN1 Q05586 1/20 0.45
GRIN2A Q12879 1/20 0.45
GRIN2B Q13224 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24754434 0.79 TTR (0.65) TTRNPC1RAB9AATMPTPRC
SCHEMBL178335 0.77 HDAC3 (0.52) NPC1RAB9AMAPTMEN1KMT2A
SCHEMBL22503291 0.75 MCL1 (0.45) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL22503305 0.75 CES2 (0.48) SCN5ASCN9AHTR7
SCHEMBL22503084 0.75 CTDSP1 (0.53) NPC1RAB9APOLBMAPTMEN1
SCHEMBL10416266 0.74 TTR (0.62) TTRNPC1RAB9AATMPTPRC
SCHEMBL30414155 0.74 TTR (0.62) TTRNPC1RAB9AATMPTPRC
SCHEMBL19302481 0.74 TTR (0.62) TTRNPC1RAB9AATMPTPRC
SCHEMBL26163053 0.74 HDAC1 (0.62) NPC1RAB9AMEN1KMT2AALDH1A1
SCHEMBL9304077 0.73 PTGS1 (0.54) NPC1POLBMAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed