Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC3 | O15379 | 1/20 | 0.52 |
| ▸ | CA12 | O43570 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | IDO1 | P14902 | 1/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.52 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.52 |
| ▸ | CA9 | Q16790 | 1/20 | 0.52 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.52 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.52 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.52 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | FLT1 | P17948 | 1/20 | 0.49 |
| ▸ | FLT4 | P35916 | 1/20 | 0.49 |
| ▸ | KDR | P35968 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22503188 | 0.90 | VCP (0.45) | HDAC3CA12CA1IDO1ALOX15 | |
| SCHEMBL22503084 | 0.90 | CTDSP1 (0.53) | HDAC3HDAC1HDAC7HDAC2HDAC8 | |
| SCHEMBL22503205 | 0.87 | KMT2A (0.56) | LMNAMEN1KMT2AFLT1FLT4 | |
| SCHEMBL22503085 | 0.85 | VCP (0.52) | HDAC3CA1HDAC1CA9HDAC7 | |
| SCHEMBL22503181 | 0.85 | PTPN11 (0.51) | HDAC3HDAC1HDAC7HDAC2HDAC8 | |
| SCHEMBL22503128 | 0.83 | PTGS2 (0.49) | CA1CA9MEN1KMT2ACES1 | |
| SCHEMBL22503135 | 0.83 | SCN5A (0.57) | KMT2ANPC1RAB9ACES1MAPT | |
| SCHEMBL22503140 | 0.83 | MPO (0.47) | CA1LMNAMEN1KMT2AFLT1 | |
| SCHEMBL22503119 | 0.81 | TRPV1 (0.50) | CA1HDAC1HDAC7HDAC8HDAC6 | |
| SCHEMBL22503271 | 0.81 | PTGS1 (0.50) | CA12CA1CA9LMNAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| CN-114269732-A | Pesticidally active pyrazine-amide compounds | 先正达农作物保护股份公司 | 2022-04-01 | — | — | CN | disclosed |
| CN-113631552-A | Pesticidally active azoleamide compounds | 先正达农作物保护股份公司 | 2021-11-09 | — | — | CN | disclosed |
| CN-112739683-A | Preparation method and intermediate of brivaracetam | 上海宣泰医药科技股份有限公司 | 2021-04-30 | — | — | CN | disclosed |
| US-10792489-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10290900-B2 | Non-aqueous electrolytic solution and lithium ion secondary battery comprising same | NIPPON SHOKUBAI CO., LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-20170117582-A1 | NON-AQUEOUS ELECTROLYTIC SOLUTION AND LITHIUM ION SECONDARY BATTERY COMPRISING SAME | NIPPON SHOKUBAI CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170117582-A1 | NON-AQUEOUS ELECTROLYTIC SOLUTION AND LITHIUM ION SECONDARY BATTERY COMPRISING SAME | NIPPON SHOKUBAI CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20130078432-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130004740-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20130004739-A1 | PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20120058427-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| EP-0277814-B1 | ANTI-GLAUCOMA USE OF TRIFLUOROMETHANESULFONAMIDE | RIKER LABORATORIES, INC. (US) | 1993-07-28 | — | — | EP | disclosed |
| US-4824866-A | Anti-glaucoma use of trifluoromethanesulfonamide | RIKER LABORATORIES, INC. (US) | 1989-04-25 | — | — | US | disclosed |
| EP-0277814-A2 | Anti-glaucoma use of trifluoromethanesulfonamide | RIKER LABORATORIES, INC. (US) | 1988-08-10 | — | — | EP | disclosed |