SCHEMBL22503315

SCHEMBL22503315

Cc1cc(C)c(C(=O)NS(=O)(=O)C(F)(F)F)c(C)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.43
▸ LMNA P02545 1/20 0.43
▸ HTT P42858 1/20 0.43
▸ TAS1R3 Q7RTX0 4/20 0.41
▸ TAS1R1 Q7RTX1 4/20 0.41
▸ TAS1R2 Q8TE23 4/20 0.41
▸ CA1 P00915 1/20 0.38
▸ CA2 P00918 1/20 0.38
▸ MMP1 P03956 1/20 0.38
▸ MMP2 P08253 1/20 0.38
▸ MMP9 P14780 1/20 0.38
▸ MMP8 P22894 1/20 0.38
▸ MMP13 P45452 1/20 0.38
▸ KMT2A Q03164 2/20 0.37
▸ HTR7 P34969 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ SCN5A Q14524 1/20 0.36
▸ SCN9A Q15858 1/20 0.36
▸ CCR2 P41597 1/20 0.35
▸ VCP P55072 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503184 0.74 CA1 (0.45) CA1CA2SCN5ASCN9A
SCHEMBL22503187 0.74 CA1 (0.34) SMN1; SMN2CA1CA2HTR7MAPK1
SCHEMBL22503309 0.74 HDAC1 (0.55) SMN1; SMN2LMNAHTTCA1CA2
SCHEMBL17693112 0.72 HTT (0.41) SMN1; SMN2LMNAHTTCA1CA2
SCHEMBL26163060 0.71 PTGFR (0.39) SMN1; SMN2LMNACA1CA2KMT2A
SCHEMBL22503300 0.71 FABP3 (0.49) SMN1; SMN2MAPK1SCN5ASCN9ACCR2
SCHEMBL22503312 0.70 KMT2A (0.46) LMNAHTTKMT2AHPGDMEN1
SCHEMBL25803253 0.70 SCN9A (0.35) SMN1; SMN2HTR7MAPK1SCN5ASCN9A
SCHEMBL22789846 0.69 RXFP1 (0.39) SMN1; SMN2CA1CA2MMP2MMP9
SCHEMBL22503182 0.69 CES2 (0.36) SMN1; SMN2CA1CA2HTR7MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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