SCHEMBL22503187

SCHEMBL22503187

O=C(NS(=O)(=O)C(F)(F)F)c1c(F)cc(F)cc1F

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 2/20 0.34
▸ CA2 P00918 2/20 0.34
▸ HTR7 P34969 1/20 0.34
▸ SCN9A Q15858 3/20 0.34
▸ SCN5A Q14524 1/20 0.34
▸ CCR2 P41597 2/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ PTGFR P43088 1/20 0.33
▸ CES2 O00748 1/20 0.33
▸ CES1 P23141 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.32
▸ ERN1 O75460 1/20 0.32
▸ PTGS1 P23219 2/20 0.31
▸ VCP P55072 1/20 0.31
▸ MCL1 Q07820 1/20 0.31
▸ PTGS2 P35354 1/20 0.30
▸ CCNA2 P20248 1/20 0.30
▸ CDK2 P24941 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26163060 0.86 PTGFR (0.39) CA1CA2SCN9ASCN5ACCR2
SCHEMBL22503312 0.82 KMT2A (0.46) CES2CES1
SCHEMBL22503184 0.82 CA1 (0.45) CA1CA2SCN9ASCN5A
SCHEMBL22503183 0.81 CES2 (0.50) CA1CA2HTR7SCN9ASCN5A
SCHEMBL22503208 0.80 CES2 (0.43) CA1CA2HTR7SCN9ASCN5A
SCHEMBL22503209 0.78 CES2 (0.50) SMN1; SMN2CES2CES1
SCHEMBL22503182 0.77 CES2 (0.36) CA1CA2HTR7SCN9ASCN5A
SCHEMBL17693112 0.77 HTT (0.41) CA1CA2MAPK1SMN1; SMN2
SCHEMBL26163071 0.76 CRBN (0.42) CES2CES1PTGS1
SCHEMBL22503185 0.75 CES2 (0.45) CA1CA2HTR7SCN9ASCN5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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