SCHEMBL225142

SCHEMBL225142

CC(C)(C)CC(C)(C)c1cc(Cc2cc(C(C)(C)CC(C)(C)C)cc(-n3nnc4ccccc43)c2O)c(O)c(-n2nnc3ccccc32)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KCNMA1 Q12791 2/20 0.45
▸ ATM Q13315 2/20 0.39
▸ HSD17B10 Q99714 4/20 0.38
▸ CYP3A4 P08684 3/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ ALOX15 P16050 2/20 0.38
▸ HIF1A Q16665 2/20 0.38
▸ IDH1 O75874 1/20 0.38
▸ CYP2C9 P11712 1/20 0.38
▸ TSHR P16473 4/20 0.36
▸ KMT2A Q03164 3/20 0.36
▸ SMN1; SMN2 Q16637 4/20 0.35
▸ MAPT P10636 2/20 0.35
▸ MAPK1 P28482 2/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ USP2 O75604 1/20 0.35
▸ ESR1 P03372 1/20 0.35
▸ TP53 P04637 1/20 0.35
▸ PGR P06401 1/20 0.35
▸ ADORA3 P0DMS8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3193119 0.88 KCNMA1 (0.49) KCNMA1ATMHSD17B10ALDH1A1TSHR
SCHEMBL9437970 0.87 KCNMA1 (0.40) KCNMA1ATMHSD17B10CYP3A4ALDH1A1
SCHEMBL6337162 0.86 KCNMA1 (0.45) KCNMA1ATMHSD17B10CYP3A4ALDH1A1
SCHEMBL9627040 0.85 KCNMA1 (0.46) KCNMA1ATMHSD17B10CYP3A4ALDH1A1
SCHEMBL2595377 0.82 KCNMA1 (0.55) KCNMA1ATMHSD17B10CYP3A4HIF1A
SCHEMBL29576845 0.82 KCNMA1 (0.55) KCNMA1ATMHSD17B10CYP3A4HIF1A
Bisoctrizole SCHEMBL30113083 0.80 NPC1 (0.43) HSD17B10CYP3A4ALDH1A1ALOX15HIF1A
Bisoctrizole SCHEMBL29358089 0.80 NPC1 (0.43) HSD17B10CYP3A4ALDH1A1ALOX15HIF1A
Bisoctrizole SCHEMBL5994392 0.80 NPC1 (0.43) HSD17B10CYP3A4ALDH1A1ALOX15HIF1A
Bisoctrizole SCHEMBL39191 0.80 NPC1 (0.43) HSD17B10CYP3A4ALDH1A1ALOX15HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 274 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114573910-B Thin-wall high-length-diameter-ratio polypropylene ribbon resistant to ultraviolet rays and high-low temperature impact 张家港绿洲新材料科技有限公司 2023-08-01 — — CN claimed
CN-113265124-A High-solarization terylene color fiber master batch and preparation method thereof 苏州润步新材料有限公司 2021-08-17 — — CN claimed
EP-1449836-B1 LOW DUSTING CRYSTAL TRANSFORMATIONS OF 2, 2'-METHYLENBIS 4-(1,1,3,3-TETRAMETHYLBUTYL)-6-BENZOTRIAZOLYLPHENOL AND MIXTURE THEREOF, METHOD FOR PREPARING THEM, AND ULTRAVIOLET ABSORBENT USING THE SAME CHEMIPRO KASEI KAISHA LTD (JP) 2008-06-11 — — EP claimed
US-7326744-B2 Low dusting crystal transformations of 2,2′-methylenebis[4-(1,1,3,3-tetramethylbutyl)-6-benzotriazolylphenol] and mixture thereof, method for preparing them, and ultraviolet light absorber using them CHEMPIRO KAEI KAISHA, LIMITED (JP) 2008-02-05 — — US claimed
US-20040242733-A1 Low dusting crystal transformations of 2,2'-methylenbis[4-(1,1,3,3-tetramethylbutyl)-6-benzotriazolylphenol] and mixture thereof, method for preparing them, and ultraviolet absorbent using the same CHEMIPRO KASEI KAISHA, LIMITED (JP) 2004-12-02 — — US claimed
EP-1449836-A1 LOW DUSTING CRYSTAL TRANSFORMATIONS OF 2, 2'-METHYLENBIS 4-(1,1,3,3-TETRAMETHYLBUTYL)-6-BENZOTRIAZOLYLPHENOL AND MIXTURE THEREOF, METHOD FOR PREPARING THEM, AND ULTRAVIOLET ABSORBENT USING THE SAME Chemipro Kasei Kaisha, Limited (JP) 2004-08-25 — — EP claimed
EP-0630758-B1 Heat-sensitive recording material MITSUBISHI PAPER MILLS LTD (JP) 1998-10-07 — — EP claimed
US-5466655-A STORAGE STABILITY MITSUBISHI PAPER MILLS LIMITED (JP) 1995-11-14 — — US claimed
EP-0630758-A2 Heat-sensitive recording material MITSUBISHI PAPER MILLS, LTD. (JP) 1994-12-28 — — EP claimed
EP-0490815-B1 Process for the preparation of symmetric 2,2'-methylene-bis-benzotriazolyl-phenols CIBA GEIGY AG (CH) 1994-09-21 — — EP claimed
US-5229521-A Process for the preparation of symmetrical 2,2-methylenebisbenzotriazolyl phenols CIBA-GEIGY CORPORATION (US) 1993-07-20 — — US claimed
US-4937348-A Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzotriazolylphenols) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1990-06-26 — — US claimed
US-4871793-A Polyphenylene sulfide resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis (benzotriazolylphenols) NAKAHARA YUTAKA (JP) 1989-10-03 — — US claimed
US-4812498-A Polycarbonate resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1989-03-14 — — US claimed
US-4684679-A DISCOLORATION INHIBITION ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-08-04 — — US claimed
US-4684680-A BENZOTRIAZOLYL PHENOL STABILIZER ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-08-04 — — US claimed
US-4681905-A 2,2,6,6-TETRAMETHYLPIPERIDYL COMPOUND, AND AN ALKYLIDENE-BIS-(BENZOTRIAZOLYL PHENYL) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-07-21 — — US claimed
US-20260139087-A1 COMPOUND, POLYMER, LIGHT STABILIZER COMPOSITION, RESIN COMPOSITION, COATING MATERIAL COMPOSITION, ARTICLE, SEALING MATERIAL, MOLDED ARTICLE, METHOD FOR PRODUCING WEATHER-RESISTANT RESIN COMPOSITION, AND METHOD FOR IMPROVING WEATHER RESISTANCE OF SYNTHETIC RESIN ADEKA CORPORATION (JP) 2026-05-21 — — US disclosed
EP-0180992-A2 Stabilizer compositions for synthetic resins imparting improved light stability ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-05-14 — — EP disclosed
EP-0180991-A2 Thermosetting synthetic resin lacquer compositions having improved light stability ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-05-14 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260139087-A1 COMPOUND, POLYMER, LIGHT STABILIZER COMPOSITION, RESIN COMPOSITION, COATING MATERIAL COMPOSITION, ARTICLE, SEALING MATERIAL, MOLDED ARTICLE, METHOD FOR PRODUCING WEATHER-RESISTANT RESIN COMPOSITION, AND METHOD FOR IMPROVING WEATHER RESISTANCE OF SYNTHETIC RESIN SEM1, RAD51, SUN2 KCNMA1 2513/4885ATM 2979/4885HSD17B10 3592/4885
US-20040242733-A1 Low dusting crystal transformations of 2,2'-methylenbis[4-(1,1,3,3-tetramethylbutyl)-6-benzotriazolylphenol] and mixture thereof, method for preparing them, and ultraviolet absorbent using the same TRRAP, TTI2, TTI1 KCNMA1 1775/4885ATM 2562/4885HSD17B10 3094/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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