SCHEMBL225151

SCHEMBL225151

CC(=CC(F)(F)C(F)(F)C(F)F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4866043 1.00
SCHEMBL9446214 0.88 KDM4E (0.33)
SCHEMBL3417525 0.86
SCHEMBL3417523 0.86
SCHEMBL10706684 0.82
SCHEMBL2966386 0.82
SCHEMBL532589 0.80
SCHEMBL1800854 0.79 KDM4E (0.32)
SCHEMBL10429457 0.78 PTGS1 (0.30)
SCHEMBL1737391 0.78 PTGS1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2005109041-A1 COMPOSITIONS FOR USE IN THE MANUFACTURE OF LENSES MEDICAL POLYMERS LIMITED (GB) 2005-11-17 WO claimed
WO-2023218932-A1 COMPOSITION FOR FORMING COLORED LAYERS, OPTICAL FILM, AND DISPLAY DEVICE 凸版印刷株式会社 2023-11-16 WO disclosed
WO-2023166770-A1 SUBSTRATE FOR DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE 凸版印刷株式会社 2023-09-07 WO disclosed
US-20210355284-A1 ORGANOPOLYSILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND ANTISTATIC AGENT AND CURABLE COMPOSITION, EACH OF WHICH CONTAINS SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-18 US disclosed
US-20210018666-A1 POLARIZING FILM, METHOD FOR MANUFACTURING SAME, OPTICAL FILM, AND IMAGE DISPLAY DEVICE NITTO DENKO CORPORATION (JP) 2021-01-21 US disclosed
US-20210011335-A1 ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION, POLARIZING FILM AND METHOD FOR MANUFACTURING SAME, OPTICAL FILM, AND IMAGE DISPLAY DEVICE NITTO DENKO CORPORATION (JP) 2021-01-14 US disclosed
US-10768351-B2 Optical laminate NITTO DENKO CORPORATION (JP) 2020-09-08 US disclosed
US-10620345-B2 Antireflection film and method of producing same TOPPAN PRINTING CO., LTD. (JP) 2020-04-14 US disclosed
US-10373863-B2 Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure FUJIFILM CORPORATION (JP) 2019-08-06 US disclosed
US-9937689-B2 Polarizing film, method for manufacture thereof, optical film, and image display device NITTO DENKO CORPORATION (JP) 2018-04-10 US disclosed
EP-0628610-B1 Scratch-resistant anti-soiling and anti-graffiti coating for mouldings ROEHM GMBH (DE) 1999-08-11 EP disclosed
US-5932392-A LIGHT SENSITIVE LAYER CONTAINING A COMPOUND CAPABLE OF GENERATING AN ACID ON EXPOSURE OF INFRARED RAYS, A RESOL RESIN, AN UNSATURATED RESIN CONTAINING A MONOMER UNIT WITH A PHENOLIC HYDROXY GROUP, AND AN INFRARED ABSORBER KONICA CORPORATION (JP) 1999-08-03 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed
EP-0903225-A2 Light sensitive composition and image forming material KONICA CORPORATION (JP) 1999-03-24 EP disclosed
EP-0903226-A2 Heat sensitive planographic printing plate, its manufacturing method and image forming method employing the same KONICA CORPORATION (JP) 1999-03-24 EP disclosed
EP-0884647-A1 Image forming material and image forming method KONICA CORPORATION (JP) 1998-12-16 EP disclosed
US-5773194-A PHOTOSENSITIVITY; DURABILITY KONICA CORPORATION (JP) 1998-06-30 US disclosed
EP-0762208-A2 Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate KONICA CORPORATION (JP) 1997-03-12 EP disclosed
EP-0628610-A1 Scratch-resistant anti-soiling and anti-graffity coating for mouldings RÖHM GMBH (DE) 1994-12-14 EP disclosed
EP-0628614-A1 Acrylate based scratch-resistant coating RÖHM GMBH (DE) 1994-12-14 EP disclosed