SCHEMBL4866043

SCHEMBL4866043

C/C(=C\C(F)(F)C(F)(F)C(F)F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL225151 1.00
SCHEMBL9446214 0.88 KDM4E (0.33)
SCHEMBL3417525 0.86
SCHEMBL3417523 0.86
SCHEMBL10706684 0.82
SCHEMBL2966386 0.82
SCHEMBL532589 0.80
SCHEMBL1800854 0.79 KDM4E (0.32)
SCHEMBL10429457 0.78 PTGS1 (0.30)
SCHEMBL1737391 0.78 PTGS1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2005109041-A1 COMPOSITIONS FOR USE IN THE MANUFACTURE OF LENSES MEDICAL POLYMERS LIMITED (GB) 2005-11-17 WO claimed
US-20160033686-A1 POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD OF POLARIZING PLATE PROTECTIVE FILM FUJIFILM CORPORATION (JP) 2016-02-04 US disclosed
US-7407735-B2 Light sensitive planographic printing plate precursor and its processing method KONICA CORPORATION (JP) 2008-08-05 US disclosed
US-7074546-B2 Light sensitive planographic printing plate precursor and its processing method KONICA CORPORATION (JP) 2006-07-11 US disclosed
US-20060134550-A1 Light sensitive planographic printing plate precursor and its processing method KONICA CORPORATION (JP) 2006-06-22 US disclosed
WO-2005109041-A1 COMPOSITIONS FOR USE IN THE MANUFACTURE OF LENSES MEDICAL POLYMERS LIMITED (GB) 2005-11-17 WO disclosed
EP-0903225-B1 Light sensitive composition and image forming material KONISHIROKU PHOTO IND (JP) 2004-09-22 EP disclosed
US-20040005515-A1 Light sensitive planographic printing plate precursor and its processing method KONICA CORPORATION (JP) 2004-01-08 US disclosed
EP-1378793-A2 Light sensitive planographic printing plate precursor KONICA CORPORATION (JP) 2004-01-07 EP disclosed
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
EP-0628610-B1 Scratch-resistant anti-soiling and anti-graffiti coating for mouldings ROEHM GMBH (DE) 1999-08-11 EP disclosed
US-5932392-A LIGHT SENSITIVE LAYER CONTAINING A COMPOUND CAPABLE OF GENERATING AN ACID ON EXPOSURE OF INFRARED RAYS, A RESOL RESIN, AN UNSATURATED RESIN CONTAINING A MONOMER UNIT WITH A PHENOLIC HYDROXY GROUP, AND AN INFRARED ABSORBER KONICA CORPORATION (JP) 1999-08-03 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed
EP-0903225-A2 Light sensitive composition and image forming material KONICA CORPORATION (JP) 1999-03-24 EP disclosed
EP-0903226-A2 Heat sensitive planographic printing plate, its manufacturing method and image forming method employing the same KONICA CORPORATION (JP) 1999-03-24 EP disclosed
EP-0884647-A1 Image forming material and image forming method KONICA CORPORATION (JP) 1998-12-16 EP disclosed
US-5773194-A PHOTOSENSITIVITY; DURABILITY KONICA CORPORATION (JP) 1998-06-30 US disclosed
EP-0762208-A2 Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate KONICA CORPORATION (JP) 1997-03-12 EP disclosed
EP-0628614-A1 Acrylate based scratch-resistant coating RÖHM GMBH (DE) 1994-12-14 EP disclosed
EP-0628610-A1 Scratch-resistant anti-soiling and anti-graffity coating for mouldings RÖHM GMBH (DE) 1994-12-14 EP disclosed