SCHEMBL225564

SCHEMBL225564

C[CH]NCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2204977 0.81
SCHEMBL1548215 0.75
SCHEMBL1548217 0.75
SCHEMBL28440196 0.75
SCHEMBL594121 0.73
SCHEMBL1235472 0.72
SCHEMBL10463706 0.72 CA12 (0.44)
SCHEMBL10463705 0.72 CA12 (0.44)
SCHEMBL15744 0.69
SCHEMBL226644 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11781066-B2 Wet etching composition and method ENTEGRIS, INC. (US) 2023-10-10 US disclosed
EP-4041845-A1 WET ETCHING COMPOSITION AND METHOD Entegris, Inc. (US) 2022-08-17 EP disclosed
US-11365351-B2 Wet etching composition and method ENTEGRIS, INC. (US) 2022-06-21 US disclosed
CN-111386580-B Conductive particles, compositions, articles, and methods of making conductive particles 埃卡特有限公司 2022-04-22 CN disclosed
US-20210108140-A1 WET ETCHING COMPOSITION AND METHOD MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT 2021-04-15 US disclosed
WO-2021072091-A1 WET ETCHING COMPOSITION AND METHOD ENTEGRIS, INC. (US) 2021-04-15 WO disclosed
CN-107207877-B Coated pigments, method for the production and use thereof, coating agents and articles 埃卡特有限公司 2020-09-29 CN disclosed
CN-111386580-A Conductive particles, compositions, articles, and methods of making conductive particles 埃卡特有限公司 2020-07-07 CN disclosed
EP-1864645-B1 FLUORINE ION-RELEASABLE COMPOSITION FOR DENTAL PURPOSES KURARAY NORITAKE DENTAL INC (JP) 2013-05-22 EP disclosed
US-8399575-B2 Crosslinkable materials based on organosilicon compounds WACKER CHEMIE AG (DE) 2013-03-19 US disclosed
US-20090062471-A1 CROSSLINKABLE MATERIALS BASED ON ORGANOSILICON COMPOUNDS WACKER CHEMIE AG (DE) 2009-03-05 US disclosed
US-7405327-B2 Method for the continuous production of an amine BASF AKTIENGESELLSCHAFT (DE) 2008-07-29 US disclosed
EP-1864645-A1 FLUORINE ION-RELEASABLE COMPOSITION FOR DENTAL PURPOSES Kuraray Medical Inc. (JP) 2007-12-12 EP disclosed
US-20070232833-A1 Method for the Continuous Production of an Amine BASF AKTIENGESELLSCHAFT (DE) 2007-10-04 US disclosed
EP-0821931-B1 Metal fluoride particles and a dental composition including said metal fluoride particles KURARAY CO (JP) 2003-01-15 EP disclosed
US-5908879-A A POLYSILOXANE COATING ON THE SURFACE OF THE PARTICLE. KURARAY CO., LTD. (JP) 1999-06-01 US disclosed
EP-0821931-A2 Metal fluoride particles and a dental composition including said metal fluoride particles KURARAY CO., LTD. (JP) 1998-02-04 EP disclosed
US-4658009-A Novel 2-substituted-4,6-diamino-s-triazine/isocyanuric acid adduct, process for synthesis of said adduct and process for curing polyepoxy resin with said adduct SHIKOKU CHEMICALS CORPORATION (JP) 1987-04-14 US disclosed
US-4038456-A AZIDO-SILANE COMPOSITIONS UNION CARBIDE CORPORATION (US) 1977-07-26 US disclosed
US-3944574-A Azido-silane compositions UNION CARBIDE CORPORATION (US) 1976-03-16 US disclosed