⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1696744 | 0.85 | ALDH1A1 (0.30) | — | |
| SCHEMBL9845135 | 0.82 | — | — | |
| SCHEMBL5839501 | 0.79 | CA1 (0.33) | — | |
| SCHEMBL28074586 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL25386780 | 0.76 | — | — | |
| SCHEMBL230843 | 0.76 | ZDHHC7 (0.33) | — | |
| SCHEMBL227005 | 0.76 | ZDHHC7 (0.33) | — | |
| SCHEMBL225592 | 0.75 | — | — | |
| SCHEMBL10850436 | 0.74 | — | — | |
| SCHEMBL19356779 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12623999-B2 | Carbamate production method, carbamate ester production method, and urea derivative production method | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2026-05-12 | — | — | US | disclosed |
| US-20230212110-A1 | CARBAMATE PRODUCTION METHOD, CARBAMATE ESTER PRODUCTION METHOD, AND UREA DERIVATIVE PRODUCTION METHOD | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2023-07-06 | — | — | US | disclosed |
| EP-4169901-A1 | CARBAMATE PRODUCTION METHOD, CARBAMATE ESTER PRODUCTION METHOD, AND UREA DERIVATIVE PRODUCTION METHOD | National Institute Of Advanced Industrial Science and Technology (JP) | 2023-04-26 | — | — | EP | disclosed |
| EP-3088961-B1 | CHARGING MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC IMAGE FORMATION DEVICE | CANON KK (JP) | 2021-03-10 | — | — | EP | disclosed |
| US-10459356-B2 | Charging member, process cartridge and electrophotographic image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2019-10-29 | — | — | US | disclosed |
| US-10078286-B2 | Charging member, process cartridge and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2018-09-18 | — | — | US | disclosed |
| US-10036971-B2 | Charging member, process cartridge, and electrophotographic image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2018-07-31 | — | — | US | disclosed |
| US-9989879-B2 | Charging member, process cartridge and electrophotographic image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2018-06-05 | — | — | US | disclosed |
| EP-3121655-B1 | CHARGING MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS | CANON KK (JP) | 2018-05-23 | — | — | EP | disclosed |
| US-20180101106-A1 | CHARGING MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2018-04-12 | — | — | US | disclosed |
| US-20080248280-A1 | Process for Preparing a Dispersion Liquid of Zeolite Fine Particles | SHIN-ETSU CHEMICAL CO., LTD. | 2008-10-09 | — | — | US | disclosed |
| US-7405459-B2 | Semiconductor device comprising porous film | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2008-07-29 | — | — | US | disclosed |
| US-7244657-B2 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2007-07-17 | — | — | US | disclosed |
| US-20070108593-A1 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | OGIHARA TSUTOMU | 2007-05-17 | — | — | US | disclosed |
| US-20040091419-A1 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2004-05-13 | — | — | US | disclosed |
| US-20030157245-A1 | Method for forming a mirror coating onto an optical article | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2003-08-21 | — | — | US | disclosed |
| WO-2002006173-A1 | METHOD FOR FORMING A MIRROR COATING ONTO AN OPTICAL ARTICLE | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2002-01-24 | — | — | WO | disclosed |
| EP-0691362-B1 | Method of producing organopolysiloxanes containing hydrolyzable functional groups, and curable resin composition using said organopolysiloxanes | SHINETSU CHEMICAL CO (JP) | 2000-10-25 | — | — | EP | disclosed |
| US-5633311-A | ROOM TEMPERATURE CURABLE RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| EP-0691362-A2 | Method of producing organopolysiloxanes containing hydrolyzable functional groups, and curable resin composition using said organopolysiloxanes | Shin-Etsu Chemical Co., Ltd. (JP) | 1996-01-10 | — | — | EP | disclosed |