Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | TET2 | Q6N021 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.30 |
| ▸ | LCK | P06239 | 1/20 | 0.30 |
| ▸ | FYN | P06241 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL712240 | 1.00 | TDP1 (0.35) | TDP1TET2ALDH1A1TSHRFFAR3 | |
| Methacrylic Acid SCHEMBL1203768 | 0.95 | TDP1 (0.35) | TDP1TET2ALDH1A1TSHRFFAR3 | |
| Methacrylic Acid SCHEMBL226300 | 0.95 | TDP1 (0.35) | TDP1TET2ALDH1A1TSHRFFAR3 | |
| Methacrylic Acid SCHEMBL9820945 | 0.91 | THRB (0.43) | TET2 | |
| Methacrylic Acid SCHEMBL27813493 | 0.89 | TET2 (0.32) | TET2 | |
| Methacrylic Acid SCHEMBL27833419 | 0.89 | TET2 (0.32) | TET2 | |
| Methacrylic Acid SCHEMBL1789432 | 0.85 | TET2 (0.31) | TET2 | |
| Methacrylic Acid SCHEMBL1888542 | 0.85 | TET2 (0.31) | TET2 | |
| Methacrylic Acid SCHEMBL15413303 | 0.84 | TET2 (0.32) | TET2 | |
| Methacrylic Acid SCHEMBL28486167 | 0.84 | TET2 (0.38) | TDP1TET2ALDH1A1TSHRFFAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10373863-B2 | Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure | FUJIFILM CORPORATION (JP) | 2019-08-06 | — | — | US | disclosed |
| EP-2434342-B1 | Method for producing curable composition for imprints | FUJIFILM CORP (JP) | 2018-06-20 | — | — | EP | disclosed |
| US-20170200639-A1 | METHOD OF MANUFACTURING POROUS BODY, POROUS BODY, METHOD OF MANUFACTURING DEVICE, DEVICE, METHOD OF MANUFACTURING WIRING STRUCTURE, AND WIRING STRUCTURE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-9684233-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2017-06-20 | — | — | US | disclosed |
| US-9663671-B2 | Curable composition for imprints and method of storing the same | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9482950-B2 | Curable composition for imprints, pattern-forming method and pattern | FUJIFILM CORPORATION (JP) | 2016-11-01 | — | — | US | disclosed |
| US-9335628-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| US-8999221-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8933144-B2 | Curable composition for imprint, pattern-forming method and pattern | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8877828-B2 | Method for producing curable composition for imprints | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20130032971-A1 | METHOD FOR FORMING PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES | FUJIFILM CORPORATION (JP) | 2013-02-07 | — | — | US | disclosed |
| US-20120225263-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2012-09-06 | — | — | US | disclosed |
| EP-2490072-A2 | Method for producing curable composition for imprints | Fujifilm Corporation (JP) | 2012-08-22 | — | — | EP | disclosed |
| US-20120207943-A1 | METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |
| US-20120183752-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120076950-A1 | CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120076948-A1 | METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| EP-2434342-A1 | Method for producing curable composition for imprints | FUJIFILM Corporation (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-20120004385-A1 | MAINTENANCE LIQUID | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| WO-2012002556-A1 | LIQUID APPLICATION DEVICE, LIQUID APPLICATION METHOD, AND NANOIMPRINT SYSTEM | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120004385-A1 | MAINTENANCE LIQUID | EED, PRDM9, DOT1L | TDP1 2351/4885TET2 325/4885ALDH1A1 1272/4885 |
| US-20120076950-A1 | CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS | MMAB, DNMT1, COIL | TDP1 1008/4885TET2 195/4885ALDH1A1 2453/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.