SCHEMBL226474

SCHEMBL226474

C=C(CCc1ccc2ccccc2c1)C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.61
PDPK1 O15530 1/20 0.56
FFAR1 O14842 1/20 0.51
HDAC1 Q13547 1/20 0.50
HDAC8 Q9BY41 1/20 0.50
HCAR2 Q8TDS4 3/20 0.49
SLC13A5 Q86YT5 1/20 0.49
SOX18 P35713 1/20 0.48
CYP2D6 P10635 2/20 0.45
CYP2C19 P33261 2/20 0.45
FFAR4 Q5NUL3 1/20 0.44
CYP3A4 P08684 2/20 0.43
CYP2C9 P11712 1/20 0.43
HIF1A Q16665 1/20 0.43
KDM4E B2RXH2 1/20 0.43
NPC1 O15118 1/20 0.43
LMNA P02545 1/20 0.43
TP53 P04637 1/20 0.43
MAPT P10636 1/20 0.43
MAOA P21397 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3555647 0.95 CYP1A2 (0.55) CYP1A2PDPK1FFAR1HDAC1HDAC8
SCHEMBL12076765 0.90 CYP1A2 (0.71) CYP1A2PDPK1FFAR1HDAC1HDAC8
SCHEMBL6114914 0.85 HCAR2 (0.52) CYP1A2PDPK1HCAR2CYP3A4KDM4E
SCHEMBL16595075 0.83 CYP1A2 (0.65) CYP1A2PDPK1FFAR1HDAC1HDAC8
SCHEMBL7445814 0.83 ALOX5 (0.53) CYP1A2PDPK1SLC13A5SLC6A3
SCHEMBL1217683 0.82 CYP1A2 (0.80) CYP1A2PDPK1FFAR1HDAC1HDAC8
SCHEMBL30403190 0.82 CYP1A2 (0.80) CYP1A2PDPK1FFAR1HDAC1HDAC8
Hydrochloric Acid SCHEMBL27401796 0.81 CYP1A2 (0.77) CYP1A2PDPK1FFAR1HDAC1HDAC8
SCHEMBL17940817 0.80 FFAR1 (0.64) FFAR1HDAC1HDAC8FFAR4MAPT
SCHEMBL7332873 0.80 CYP1A2 (0.66) CYP1A2PDPK1FFAR1HDAC1HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8530540-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2013-09-10 US claimed
US-20210223690-A1 PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD FOR PRODUCING FILM USING THE SAME, METHOD FOR PRODUCING OPTICAL COMPONENT USING THE SAME, METHOD FOR PRODUCING CIRCUIT BOARD USING THE SAME, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT USING THE SAME CANON KK (JP) 2021-07-22 US disclosed
US-11003073-B2 Photocurable composition for imprint, method for producing film using the same, method for producing optical component using the same, method for producing circuit board using the same, and method for producing electronic component using the same CANON KABUSHIKI KAISHA (JP) 2021-05-11 US disclosed
US-10373863-B2 Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure FUJIFILM CORPORATION (JP) 2019-08-06 US disclosed
EP-3517571-A1 (METH)ACRYLIC COPOLYMER, RESIN COMPOSITION, MOLDED BODY OF SAME, AND METHOD FOR PRODUCING MOLDED BODY Mitsubishi Gas Chemical Company, Inc. (JP) 2019-07-31 EP disclosed
US-9868846-B2 Curable composition for imprints, patterning method and pattern FUJIFILM CORPORATION (JP) 2018-01-16 US disclosed
US-9862847-B2 Inkjet discharge method, pattern formation method, and pattern FUJIFILM CORPORATION (JP) 2018-01-09 US disclosed
US-20170351172-A1 PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD FOR PRODUCING FILM USING THE SAME, METHOD FOR PRODUCING OPTICAL COMPONENT USING THE SAME, METHOD FOR PRODUCING CIRCUIT BOARD USING THE SAME, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT USING THE SAME CANON KABUSHIKI KAISHA (JP) 2017-12-07 US disclosed
US-20170200639-A1 METHOD OF MANUFACTURING POROUS BODY, POROUS BODY, METHOD OF MANUFACTURING DEVICE, DEVICE, METHOD OF MANUFACTURING WIRING STRUCTURE, AND WIRING STRUCTURE FUJIFILM CORPORATION (JP) 2017-07-13 US disclosed
US-9482950-B2 Curable composition for imprints, pattern-forming method and pattern FUJIFILM CORPORATION (JP) 2016-11-01 US disclosed
US-20140050900-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERN-FORMING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20120231234-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2012-09-13 US disclosed
US-20120207943-A1 METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS FUJIFILM CORPORATION (JP) 2012-08-16 US disclosed
US-20120004385-A1 MAINTENANCE LIQUID FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed
US-20110183127-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
EP-1681674-B1 Protective film for optical disks and optical disk using the same LINTEC CORP (JP) 2011-03-09 EP disclosed
US-20100009138-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009137-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
EP-1681674-A2 Protective film for optical disks and optical disk using the same LINTEC Corporation (JP) 2006-07-19 EP disclosed
US-20060153057-A1 Protective film for optical disks and optical disk using the same LINTEC CORPORATION (JP) 2006-07-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120004385-A1 MAINTENANCE LIQUID EED, PRDM9, DOT1L CYP1A2 1088/4885PDPK1 2655/4885FFAR1 3800/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.