SCHEMBL226502

SCHEMBL226502

CCCCOc1ccccc1N[C]=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.54
CYP1A2 P05177 2/20 0.50
CYP2C9 P11712 2/20 0.50
CYP2C19 P33261 2/20 0.50
POLB P06746 1/20 0.50
TSHR P16473 1/20 0.50
MEN1 O00255 3/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
CYP19A1 P11511 1/20 0.43
MAPT P10636 4/20 0.43
LMNA P02545 3/20 0.43
ALDH1A1 P00352 2/20 0.43
KDM4E B2RXH2 2/20 0.43
HTT P42858 2/20 0.43
GAA P10253 2/20 0.43
ALOX15 P16050 1/20 0.43
PKM P14618 1/20 0.43
NLRP1 Q9C000 1/20 0.43
NR1I2 O75469 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10389740 0.95 KMT2A (0.49) KMT2ACYP1A2CYP2C9CYP2C19POLB
SCHEMBL6769635 0.94 KMT2A (0.50) KMT2ACYP1A2CYP2C9CYP2C19POLB
SCHEMBL2201550 0.94 KMT2A (0.50) KMT2ACYP1A2CYP2C9CYP2C19POLB
SCHEMBL8957740 0.92 KMT2A (0.52) KMT2ACYP1A2CYP2C9CYP2C19POLB
SCHEMBL5361999 0.84 GAA (0.56) KMT2ACYP2C19POLBTSHRMEN1
SCHEMBL10871089 0.80 CYP1A2 (0.58) KMT2ACYP1A2CYP2C9CYP2C19POLB
SCHEMBL5145684 0.80 ALDH1A1 (0.46) KMT2APOLBTSHRMEN1MAPT
SCHEMBL11802472 0.79 CYP1A2 (0.56) KMT2ACYP1A2CYP2C9CYP2C19POLB
SCHEMBL4640108 0.78 NPC1 (0.42) TSHRNPC1RAB9ACYP19A1TP53
SCHEMBL4640650 0.77 NR5A1 (0.44) TSHRNPC1RAB9ACYP19A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8637220-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-01-28 US disclosed
US-20120003583-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed
US-5864043-A CARDIOVASCULAR DISORDERS AND ANGIOTENSIN ANTAGONIST KARL THOMAE GMBH (DE) 1999-01-26 US disclosed
US-5541229-A ANGIOITENSIN II ANTAGONIST AS HYPOTENSIVE AGENTS, ANTIISCHEMIC AGENTS AND CARDIOVASCULAR DISORDERS DR. KARL THOMAE GMBH (DE) 1996-07-30 US disclosed
EP-0307927-B1 Silver halide color photosensitive material FUJI PHOTO FILM CO LTD (JP) 1994-06-22 EP disclosed
US-H1248-H SUPERIOR DESILVERING SPEED, GOOD COLOR REFORMING PROPERTIES AND MINIMUM IMAGE DENSITIES FUJI PHOTO FILM CO., LTD. (JP) 1993-11-02 US disclosed
EP-0295632-B1 SILVER HALIDE COLOR PHOTOGRAPHIC MATERIALS FUJI PHOTO FILM CO., LTD. (JP) 1993-03-03 EP disclosed
US-5064750-A Naphthol amido coupler, bleaching bath of diamino propane teraacetato iron complex FUJI PHOTO FILM CO., LTD. (JP) 1991-11-12 US disclosed
EP-0307927-A2 Silver halide color photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1989-03-22 EP disclosed
EP-0295632-A2 Silver halide color photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1988-12-21 EP disclosed