Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.53 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.53 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 1/20 | 0.51 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.51 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.51 |
| ▸ | HTR2B | P41595 | 1/20 | 0.51 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.51 |
| ▸ | MCHR1 | Q99705 | 3/20 | 0.49 |
| ▸ | LTA4H | P09960 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | TLR8 | Q9NR97 | 2/20 | 0.45 |
| ▸ | CYSLTR2 | Q9NS75 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7744681 | 0.98 | LMNA (0.54) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL9180737 | 0.98 | LMNA (0.54) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL9189839 | 0.98 | LMNA (0.54) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL2551991 | 0.98 | LMNA (0.54) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL9176467 | 0.98 | LMNA (0.54) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL543715 | 0.94 | CYP1A2 (0.60) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL27743321 | 0.93 | LMNA (0.50) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL28182712 | 0.89 | CYP1A2 (0.55) | CYP1A2CYP2C9CYP2C19CYP3A4MEN1 | |
| SCHEMBL9195798 | 0.88 | CYP1A2 (0.47) | CYP1A2CYP2C9CYP2C19MEN1LMNA | |
| SCHEMBL31226479 | 0.88 | CYP1A2 (0.47) | CYP1A2CYP2C9CYP2C19MEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5290911-A | Forming polymers by catalytic oxidative coupling | RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) | 1994-03-01 | — | — | US | claimed |
| US-9927704-B2 | Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof | DSM IP ASSETS, B.V. (NL) | 2018-03-27 | — | — | US | disclosed |
| US-9864274-B2 | Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof | DSM IP ASSETS B.V. (NL) | 2018-01-09 | — | — | US | disclosed |
| US-20170087765-A1 | COLOR AND/OR OPACITY CHANGING LIQUID RADIATION CURABLE RESINS, AND METHODS FOR USING THE SAME IN ADDITIVE FABRICATION | DSM IP ASSET B V (NL) | 2017-03-30 | — | — | US | disclosed |
| EP-3122529-A1 | COLOR AND/OR OPACITY CHANGING LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION | DSM IP Assets B.V. (NL) | 2017-02-01 | — | — | EP | disclosed |
| EP-2512779-B1 | SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS | DSM IP ASSETS BV (NL) | 2017-01-25 | — | — | EP | disclosed |
| EP-2513722-B1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION, PROCESS FOR MAKING A THREE-DIMENSIONAL OBJECT USING THE SAME | DSM IP ASSETS BV (NL) | 2017-01-25 | — | — | EP | disclosed |
| EP-2502728-B1 | Lightweight and high strength three-dimensional articles producible by additive fabrication processes | DSM IP ASSETS BV (NL) | 2017-01-04 | — | — | EP | disclosed |
| EP-2526463-B1 | METHOD OF FORMING A THREE-DIMENSIONAL ARTICLE HAVING SELECTIVE VISUAL EFFECTS | DSM IP ASSETS BV (NL) | 2016-07-13 | — | — | EP | disclosed |
| US-9034236-B2 | Substrate-based additive fabrication process | DSM IP ASSETS B.V. (NL) | 2015-05-19 | — | — | US | disclosed |
| WO-2011084578-A1 | SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS | DSM IP ASSETS, B.V. (NL) | 2011-07-14 | — | — | WO | disclosed |
| WO-2011075555-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP ASSETS, B.V. (NL) | 2011-06-23 | — | — | WO | disclosed |
| EP-0402481-B1 | PRODUCTION OF POLYARYLENE THIOETHER | PROD DEV RES INST (JP) | 1995-10-25 | — | — | EP | disclosed |
| US-5290911-A | Forming polymers by catalytic oxidative coupling | RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) | 1994-03-01 | — | — | US | disclosed |
| US-5153305-A | From diaryl disulfide; mild conditions using organometallic catalyst | RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) | 1992-10-06 | — | — | US | disclosed |
| US-4983720-A | Process for preparing a polyarylene thioether | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1991-01-08 | — | — | US | disclosed |
| EP-0402481-A1 | PRODUCTION OF POLYARYLENE THIOETHER | RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) | 1990-12-19 | — | — | EP | disclosed |
| US-4931542-A | Process for preparing a polyarylene thioether | IDEMITSU PETROCHEMICAL COMPANY, LIMITED (JP) | 1990-06-05 | — | — | US | disclosed |
| US-4876027-A | Optically active composition, mesomorphic compound and liquid crystal device | CANON KABUSHIKI KAISHA (JP) | 1989-10-24 | — | — | US | disclosed |
| EP-0281036-A2 | A process for preparing a polyarylene thioether | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1988-09-07 | — | — | EP | disclosed |