Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.60 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.60 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.60 |
| ▸ | MCHR1 | Q99705 | 2/20 | 0.47 |
| ▸ | LTA4H | P09960 | 2/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.45 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.45 |
| ▸ | HTR2B | P41595 | 1/20 | 0.45 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.45 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.45 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28182712 | 0.94 | CYP1A2 (0.55) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL2266183 | 0.94 | CYP1A2 (0.53) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL7744681 | 0.92 | LMNA (0.54) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL9180737 | 0.92 | LMNA (0.54) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL2551991 | 0.92 | LMNA (0.54) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL9189839 | 0.92 | LMNA (0.54) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL9176467 | 0.92 | LMNA (0.54) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H | |
| SCHEMBL9195798 | 0.89 | CYP1A2 (0.47) | CYP1A2CYP2C19CYP2C9MCHR1KMT2A | |
| SCHEMBL31226479 | 0.89 | CYP1A2 (0.47) | CYP1A2CYP2C19CYP2C9MCHR1KMT2A | |
| SCHEMBL27743321 | 0.87 | LMNA (0.50) | CYP1A2CYP2C19CYP2C9MCHR1LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5290911-A | Forming polymers by catalytic oxidative coupling | RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) | 1994-03-01 | — | — | US | claimed |
| EP-0170164-B1 | SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-05 | — | — | EP | claimed |
| US-H122-H | PYRAZOLOAZOLE-TYPE MAGENTA COUPLER DISPERSED IN A HIGH-BOILING PHOSPHATE SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 1986-09-02 | — | — | US | claimed |
| EP-0170164-A2 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1986-02-05 | — | — | EP | claimed |
| CN-114141962-B | Film preparation method, light-emitting substrate and light-emitting device | 北京京东方技术开发有限公司 | 2024-04-26 | — | — | CN | disclosed |
| WO-2023002928-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | 株式会社ADEKA | 2023-01-26 | — | — | WO | disclosed |
| CN-114141962-A | Film layer preparation method, light-emitting substrate and light-emitting device | 北京京东方技术开发有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-105264440-B | Anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2019-09-24 | — | — | CN | disclosed |
| CN-106133604-B | Protectant composition and protectant pattern forming method | 三菱瓦斯化学株式会社 | 2019-09-06 | — | — | CN | disclosed |
| CN-104737073-B | Anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-103733135-B | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | 三菱瓦斯化学株式会社 | 2018-11-27 | — | — | CN | disclosed |
| US-4594313-A | Containing hetero rings | FUJI PHOTO FILM CO., LTD. (JP) | 1986-06-10 | — | — | US | disclosed |
| US-4590153-A | CONTAINING MAGENTA COUPLER AND METAL COMPLEX | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-20 | — | — | US | disclosed |
| EP-0177765-A1 | Silver halide color photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1986-04-16 | — | — | EP | disclosed |
| EP-0176804-A1 | Silver halide color photograhic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1986-04-09 | — | — | EP | disclosed |
| EP-0175573-A2 | Light-sensitive silver halide color photographic material | KONICA CORPORATION (JP) | 1986-03-26 | — | — | EP | disclosed |
| EP-0170164-A2 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1986-02-05 | — | — | EP | disclosed |
| US-4559297-A | DISCOLORATION INHIBITION | FUJI PHOTO FILM CO., LTD. (JP) | 1985-12-17 | — | — | US | disclosed |
| EP-0164130-A2 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1985-12-11 | — | — | EP | disclosed |