Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL2265094 | 1.00 | TSHR (0.36) | TSHR | |
| Ethylene Glycol SCHEMBL3717642 | 0.89 | TSHR (0.43) | TSHR | |
| Ethylene Glycol SCHEMBL7940950 | 0.88 | TSHR (0.35) | TSHR | |
| Ethylene Glycol SCHEMBL2268824 | 0.86 | LMNA (0.38) | TSHR | |
| Ethylene Glycol SCHEMBL2266457 | 0.86 | LMNA (0.38) | TSHR | |
| Ethylene Glycol SCHEMBL4539186 | 0.82 | TSHR (0.31) | TSHR | |
| Ethylene Glycol SCHEMBL16933860 | 0.79 | TSHR (0.33) | TSHR | |
| Acetic Acid SCHEMBL28788253 | 0.78 | CHRM1 (0.39) | TSHR | |
| SCHEMBL8772 | 0.78 | MAPK1 (0.42) | TSHR | |
| Ethylene Glycol SCHEMBL6817458 | 0.77 | TSHR (0.30) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113169248-B | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2024-10-01 | — | — | CN | disclosed |
| WO-2022208663-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | 昭和電工マテリアルズ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220187517-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-06-16 | — | — | US | disclosed |
| CN-113557610-A | Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion | 昭和电工材料株式会社 | 2021-10-26 | — | — | CN | disclosed |
| US-20210292643-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION | SHOWA DENKO MATERIALS CO LTD (JP) | 2021-09-23 | — | — | US | disclosed |
| CN-113169248-A | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-11061278-B2 | Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-20210139769-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210139768-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| WO-2021084603-A1 | RESIN COMPOSITION FOR WAVELENGTH CONVERSION, CURED RESIN MATERIAL FOR WAVELENGTH CONVERSION, WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE | 昭和電工マテリアルズ株式会社 | 2021-05-06 | — | — | WO | disclosed |
| EP-2874181-A1 | COMPOSITION FOR FORMATION OF PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, SOLAR CELL ELEMENT, METHOD FOR MANUFACTURING SOLAR CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2015-05-20 | — | — | EP | disclosed |
| US-20150099352-A1 | COMPOSITION FOR FORMING n-TYPE DIFFUSION LAYER, METHOD OF PRODUCING n-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT | HITACHI CHEMICAL COMPANY, LTD. | 2015-04-09 | — | — | US | disclosed |
| US-20140227821-A1 | P-TYPE DIFFUSION LAYER FORMING COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-14 | — | — | US | disclosed |
| EP-2743967-A1 | COMPOSITION THAT FORMS N-TYPE DIFFUSION LAYER, N-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD | Hitachi Chemical Company, Ltd. (JP) | 2014-06-18 | — | — | EP | disclosed |
| EP-2728624-A1 | SEMICONDUCTOR SUBSTRATE, MANUFACTURING METHOD THEREFOR, SOLAR-CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2014-05-07 | — | — | EP | disclosed |
| EP-2662883-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Company, Ltd. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-20130025669-A1 | PHOTOVOLTAIC CELL SUBSTRATE, METHOD OF PRODUCING PHOTOVOLTAIC CELL SUBSTRATE, PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2013-01-31 | — | — | US | disclosed |
| US-20110212564-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-09-01 | — | — | US | disclosed |
| US-20110195540-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-08-11 | — | — | US | disclosed |
| EP-2355137-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Co., Ltd. (JP) | 2011-08-10 | — | — | EP | disclosed |