Ethylene Glycol

Ethylene Glycol

SCHEMBL2268824

C=CC.C=CC.C=CC.C=CC.CCCCCC(C)OC(C)CCCCC.OCCO

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.38
FAAH O00519 5/20 0.37
CNR1 P21554 1/20 0.36
CNR2 P34972 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
OPRM1 P35372 1/20 0.35
ALDH1A1 P00352 2/20 0.34
HSD17B10 Q99714 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
TSHR P16473 1/20 0.34
CA1 P00915 2/20 0.34
SPHK1 Q9NYA1 2/20 0.34
TP53 P04637 1/20 0.33
ADH1B P00325 1/20 0.32
ADH1C P00326 1/20 0.32
ADH1A P07327 1/20 0.32
ADH4 P08319 1/20 0.32
ADH7 P40394 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL2266457 1.00 LMNA (0.38) LMNAFAAHCNR1CNR2SMN1; SMN2
Ethylene Glycol SCHEMBL7940950 0.94 TSHR (0.35) LMNAFAAHCNR1CNR2SMN1; SMN2
Ethylene Glycol SCHEMBL15662978 0.90 LMNA (0.44) LMNAFAAHCNR1CNR2SMN1; SMN2
Ethylene Glycol SCHEMBL11060039 0.88 LMNA (0.45) LMNAFAAHCNR1CNR2SMN1; SMN2
Ethylene Glycol SCHEMBL25262539 0.88 LMNA (0.48) LMNAFAAHCNR1CNR2SMN1; SMN2
Ethylene Glycol SCHEMBL25260199 0.88 LMNA (0.48) LMNAFAAHCNR1CNR2SMN1; SMN2
Ethylene Glycol SCHEMBL2265094 0.86 TSHR (0.36) TSHR
Ethylene Glycol SCHEMBL2267728 0.86 TSHR (0.36) TSHR
Ethylene Glycol SCHEMBL25302907 0.83 ALDH1A1 (0.41) LMNAFAAHCNR1CNR2SMN1; SMN2
Propylene Glycol SCHEMBL29291482 0.83 GPR84 (0.40) FAAHCNR1CNR2ALDH1A1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113169248-B Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2024-10-01 CN disclosed
WO-2022208663-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION 昭和電工マテリアルズ株式会社 2022-10-06 WO disclosed
US-20220187517-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION SHOWA DENKO MATERIALS CO., LTD. (JP) 2022-06-16 US disclosed
CN-113557610-A Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion 昭和电工材料株式会社 2021-10-26 CN disclosed
US-20210292643-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION SHOWA DENKO MATERIALS CO LTD (JP) 2021-09-23 US disclosed
CN-113169248-A Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2021-07-23 CN disclosed
US-11061278-B2 Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion SHOWA DENKO MATERIALS CO., LTD. (JP) 2021-07-13 US disclosed
US-20210139768-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-05-13 US disclosed
US-20210139769-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-05-13 US disclosed
WO-2021084603-A1 RESIN COMPOSITION FOR WAVELENGTH CONVERSION, CURED RESIN MATERIAL FOR WAVELENGTH CONVERSION, WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE 昭和電工マテリアルズ株式会社 2021-05-06 WO disclosed
US-20150179829-A1 COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. (JP) 2015-06-25 US disclosed
US-20150099352-A1 COMPOSITION FOR FORMING n-TYPE DIFFUSION LAYER, METHOD OF PRODUCING n-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT HITACHI CHEMICAL COMPANY, LTD. 2015-04-09 US disclosed
US-20140227821-A1 P-TYPE DIFFUSION LAYER FORMING COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-08-14 US disclosed
EP-2743967-A1 COMPOSITION THAT FORMS N-TYPE DIFFUSION LAYER, N-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD Hitachi Chemical Company, Ltd. (JP) 2014-06-18 EP disclosed
EP-2728624-A1 SEMICONDUCTOR SUBSTRATE, MANUFACTURING METHOD THEREFOR, SOLAR-CELL ELEMENT, AND SOLAR CELL Hitachi Chemical Company, Ltd. (JP) 2014-05-07 EP disclosed
EP-2662883-A1 Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell Hitachi Chemical Company, Ltd. (JP) 2013-11-13 EP disclosed
US-20130025669-A1 PHOTOVOLTAIC CELL SUBSTRATE, METHOD OF PRODUCING PHOTOVOLTAIC CELL SUBSTRATE, PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2013-01-31 US disclosed
US-20110212564-A1 METHOD FOR PRODUCING PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2011-09-01 US disclosed
US-20110195540-A1 COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2011-08-11 US disclosed
EP-2355137-A1 Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell Hitachi Chemical Co., Ltd. (JP) 2011-08-10 EP disclosed