⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL329234 | 0.74 | FDPS (0.35) | — | |
| SCHEMBL27131003 | 0.73 | FDPS (0.39) | — | |
| SCHEMBL437673 | 0.69 | FDPS (0.36) | — | |
| SCHEMBL20811 | 0.69 | — | — | |
| SCHEMBL2567591 | 0.69 | FDPS (0.36) | — | |
| SCHEMBL2268586 | 0.69 | — | — | |
| SCHEMBL27131531 | 0.69 | MMP1 (0.33) | — | |
| SCHEMBL2273840 | 0.69 | — | — | |
| SCHEMBL2271246 | 0.69 | — | — | |
| SCHEMBL2102047 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | LAM RES CORP (US) | 2026-03-12 | — | — | US | disclosed |
| US-20250372367-A1 | DEPOSITION AND ETCH OF SILICON-CONTAINING LAYER | LAM RES CORP (US) | 2025-12-04 | — | — | US | disclosed |
| US-20250197996-A1 | LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE | LAM RES CORP (US) | 2025-06-19 | — | — | US | disclosed |
| US-20250188609-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RES CORP (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250166989-A1 | THERMAL FILM DEPOSITION | LAM RES CORP (US) | 2025-05-22 | — | — | US | disclosed |
| CN-119604963-A | Hybrid atomic layer deposition | 朗姆研究公司 | 2025-03-11 | — | — | CN | disclosed |
| CN-119487614-A | Deposition and etching of silicon-containing layers | 朗姆研究公司 | 2025-02-18 | — | — | CN | disclosed |
| US-20250054747-A1 | CONFORMAL DEPOSITION OF SILICON NITRIDE | LAM RES CORP (US) | 2025-02-13 | — | — | US | disclosed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | disclosed |
| US-20250014890-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | LAM RESEARCH CORPORATION | 2025-01-09 | — | — | US | disclosed |
| EP-0172579-B1 | MODIFIED SILICEOUS SUPPORTS | Cuno Incorporated (US) | 1992-11-19 | — | — | EP | disclosed |
| EP-0112434-B1 | HYDROGEN BEARING SILYL CARBAMATES | UNION CARBIDE CORPORATION (US) | 1988-08-17 | — | — | EP | disclosed |
| EP-0273456-A2 | Vapor phase alcoholysis of aminosilanes and carbamatosilanes | UNION CARBIDE CORPORATION (US) | 1988-07-06 | — | — | EP | disclosed |
| US-4730074-A | Vapor phase alcoholysis of aminosilanes and carbamatosilanes | UNION CARBIDE CORPORATION (US) | 1988-03-08 | — | — | US | disclosed |
| US-4724207-A | SILICA BONDED TO POLYMER GROUPS | CUNO INCORPORATED (US) | 1988-02-09 | — | — | US | disclosed |
| EP-0098912-B1 | PROCESS FOR THE PREPARATION OF ALKOXYHYDRIDOSILANES | UNION CARBIDE CORPORATION (US) | 1986-04-23 | — | — | EP | disclosed |
| EP-0172579-A2 | Modified siliceous supports | Cuno Incorporated (US) | 1986-02-26 | — | — | EP | disclosed |
| EP-0098911-A1 | Improved process for the preparation of oximatohydridosilanes and aminoxyhydridosilanes | UNION CARBIDE CORPORATION (US) | 1984-01-25 | — | — | EP | disclosed |
| US-4395564-A | REACTING AN ALCOHOL WITH SILYL-AMINE | UNION CARBIDE CORPORATION (US) | 1983-07-26 | — | — | US | disclosed |
| US-4384131-A | Process for the preparation of oximatohydridosilanes and aminoxyhydridosilanes | UNION CARBIDE CORPORATION (US) | 1983-05-17 | — | — | US | disclosed |