⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22974968 | 0.70 | — | — | |
| SCHEMBL2271768 | 0.69 | — | — | |
| SCHEMBL2272599 | 0.65 | — | — | |
| SCHEMBL2462816 | 0.64 | — | — | |
| SCHEMBL9794496 | 0.64 | — | — | |
| SCHEMBL7388802 | 0.64 | — | — | |
| SCHEMBL17987659 | 0.62 | — | — | |
| Propane SCHEMBL28058493 | 0.58 | — | — | |
| SCHEMBL705157 | 0.58 | — | — | |
| Propane SCHEMBL25366971 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12272557-B2 | Semiconductor device and method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-04-08 | — | — | US | claimed |
| US-11862468-B2 | Semiconductor device and method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-01-02 | — | — | US | claimed |
| US-20230377891-A1 | SEMICONDUCTOR DEVICE AND METHOD | TAIWAN SEMICONDUCOR MFG CO LTD (TW) | 2023-11-23 | — | — | US | claimed |
| US-20220246433-A1 | Semiconductor Device and Method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-08-04 | — | — | US | claimed |
| CN-109266181-A | A kind of ceramic modified epoxy coating of fire resistant water-based inorganic nano and preparation method thereof | 湖南凯斯利新材料有限公司 | 2019-01-25 | — | — | CN | claimed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| CN-101624698-A | Aminosilane used for shallow trench isolation thin film | AIR PROD & CHEM | 2010-01-13 | — | — | CN | claimed |
| US-20260082833-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2026-03-19 | — | — | US | disclosed |
| US-12494364-B2 | Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium | Kokusai Electric Corporation (JP) | 2025-12-09 | — | — | US | disclosed |
| US-12431336-B2 | Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus | Kokusai Electric Corporation (JP) | 2025-09-30 | — | — | US | disclosed |
| US-12381091-B2 | Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus | Kokusai Electric Corporation (JP) | 2025-08-05 | — | — | US | disclosed |
| CN-120033118-A | Processing method, semiconductor device manufacturing method, processing apparatus, and program product | 株式会社国际电气 | 2025-05-23 | — | — | CN | disclosed |
| US-12272557-B2 | Semiconductor device and method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-04-08 | — | — | US | disclosed |
| CN-103026472-A | Method for depositing cyclic thin film | EUGENE TECHNOLOGY CO LTD | 2013-04-03 | — | — | CN | disclosed |
| CN-103026471-A | Method for depositing cyclic thin film | EUGENE TECHNOLOGY CO LTD | 2013-04-03 | — | — | CN | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| CN-102686773-A | Film forming method and film forming apparatus | TOKYO ELECTRON LTD | 2012-09-19 | — | — | CN | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | disclosed |