⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2481172 | 0.97 | — | — | |
| SCHEMBL28568734 | 0.85 | — | — | |
| Nitrous Acid SCHEMBL5509794 | 0.81 | CA1 (0.30) | — | |
| SCHEMBL21657784 | 0.79 | — | — | |
| SCHEMBL31531230 | 0.72 | — | — | |
| Ammonia Solution, Strong SCHEMBL28391001 | 0.71 | FDPS (0.38) | — | |
| SCHEMBL1131877 | 0.71 | TSHR (0.37) | — | |
| SCHEMBL640974 | 0.71 | FDPS (0.35) | — | |
| SCHEMBL2479174 | 0.71 | TSHR (0.30) | — | |
| SCHEMBL25275043 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117872693-A | Positive photoresist stripping solution, preparation method and application thereof | 深圳市松柏科工股份有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-116964122-A | Polyurea copolymers | 巴斯夫欧洲公司 | 2023-10-27 | — | — | CN | claimed |
| CN-117872693-B | Positive photoresist stripping solution, preparation method and application thereof | 深圳市松柏科工股份有限公司 | 2024-07-12 | — | — | CN | disclosed |
| CN-117872693-A | Positive photoresist stripping solution, preparation method and application thereof | 深圳市松柏科工股份有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-114555556-B | Process for preparing CFTR modulators | 弗特克斯药品有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-116964122-A | Polyurea copolymers | 巴斯夫欧洲公司 | 2023-10-27 | — | — | CN | disclosed |
| CN-115315783-A | Laminate, method for producing laminate, and method for producing semiconductor substrate | 东京应化工业株式会社 | 2022-11-08 | — | — | CN | disclosed |
| CN-114555556-A | Methods of making CFTR modulators | 弗特克斯药品有限公司 | 2022-05-27 | — | — | CN | disclosed |
| CN-109970574-B | Preparation method of N, N-diisopropyl-1, 3-propane diamine | 中北大学 | 2022-04-15 | — | — | CN | disclosed |
| US-11120993-B2 | Diffusing agent composition and method of manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-09-14 | — | — | US | disclosed |
| US-20200373162-A1 | DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-26 | — | — | US | disclosed |