SCHEMBL2268700

SCHEMBL2268700

CCCCN(C)[SiH2]c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.43
OPRM1 P35372 2/20 0.42
OPRL1 P41146 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
SIGMAR1 Q99720 1/20 0.38
KCNH2 Q12809 2/20 0.38
GAA P10253 1/20 0.37
HPGD P15428 1/20 0.37
DRD2 P14416 1/20 0.36
DRD3 P35462 1/20 0.36
OPRD1 P41143 1/20 0.36
OPRK1 P41145 1/20 0.36
MAPT P10636 1/20 0.36
HTT P42858 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2271660 0.78 TDP1 (0.42) TDP1OPRM1OPRL1MEN1KMT2A
SCHEMBL17046077 0.73 TP53 (0.39) TDP1OPRM1SIGMAR1KCNH2DRD3
SCHEMBL2101845 0.72 KCNH2 (0.43) TDP1OPRM1MEN1KMT2ANPSR1
SCHEMBL2104285 0.71 TDP1 (0.37) TDP1OPRM1OPRL1MEN1KMT2A
SCHEMBL96161 0.70 MAPT (0.55) TDP1OPRM1OPRL1MEN1KMT2A
Hydrochloric Acid SCHEMBL8801549 0.68 MAPT (0.53) TDP1OPRM1OPRL1MEN1KMT2A
Ammonia Solution, Strong SCHEMBL11366087 0.68 MAPT (0.53) TDP1OPRM1OPRL1MEN1KMT2A
Toluene SCHEMBL16465853 0.68 HTR2A (0.48) TDP1OPRM1OPRL1MEN1KMT2A
SCHEMBL19692244 0.68 KCNH2 (0.41) TDP1OPRM1OPRL1MEN1KMT2A
SCHEMBL1274186 0.67 LTA4H (0.38) TDP1MEN1KMT2ASIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
EP-0188285-A2 Process for the preparation of organopolysiloxane elastomers and an application of this process Wacker-Chemie GmbH (DE) 1986-07-23 EP disclosed
US-4212925-A TREATING SILICON DIOXIDE WITH AN ORGANOSILICON COMPOUND WACKER-CHEMIE GMBH (DE) 1980-07-15 US disclosed
EP-0002502-A1 Method for improving heat insulating materials Wacker-Chemie GmbH (DE) 1979-06-27 EP disclosed