SCHEMBL2269082

SCHEMBL2269082

CCN(CC)C(C)C[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2565949 0.73 FDPS (0.33)
SCHEMBL4358831 0.73 FDPS (0.33)
SCHEMBL13452838 0.73
SCHEMBL193496 0.73
SCHEMBL8413930 0.71
Hydrochloric Acid SCHEMBL22575404 0.71 KDM4E (0.34)
SCHEMBL2102070 0.71 FDPS (0.32)
SCHEMBL23319706 0.71
SCHEMBL8607 0.71 FDPS (0.33)
Bromide SCHEMBL14778203 0.69 FDPS (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117904602-A Method for depositing conformal metal or metalloid silicon nitride films 弗萨姆材料美国有限责任公司 2024-04-19 CN disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed