Acetic Acid Pentyl Ester

Acetic Acid Pentyl Ester

SCHEMBL2269446

CC(O)CO.CCCCCOC(C)=O.CCOCC

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

SLC5A2

The experimentally established mechanism targets of Acetic Acid Pentyl Ester. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.55
TSHR P16473 3/20 0.48
USP2 O75604 1/20 0.42
NAAA Q02083 1/20 0.42
CES2 O00748 1/20 0.41
MAPT P10636 1/20 0.40
PLA2G2C Q5R387 1/20 0.40
EPHX1 P07099 1/20 0.40
KDM4E B2RXH2 1/20 0.38
DUSP3 P51452 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hexyl Acetate SCHEMBL896029 0.98 ALDH1A1 (0.53) ALDH1A1TSHRUSP2NAAACES2
Tetradecylacetate SCHEMBL466058 0.98 ALDH1A1 (0.53) ALDH1A1TSHRUSP2NAAACES2
Acetic Acid Butyl Ester SCHEMBL107642 0.95 ALDH1A1 (0.62) ALDH1A1TSHRUSP2MAPT
Acetic Acid Pentyl Ester SCHEMBL27685689 0.93 ALDH1A1 (0.63) ALDH1A1TSHRUSP2NAAAMAPT
Octyl Acetate SCHEMBL27849660 0.91 ALDH1A1 (0.61) ALDH1A1TSHRUSP2NAAACES2
Tetradecylacetate SCHEMBL633019 0.91 ALDH1A1 (0.61) ALDH1A1TSHRUSP2NAAACES2
Acetic Acid Pentyl Ester SCHEMBL27678839 0.90 ALDH1A1 (0.60) ALDH1A1TSHRUSP2NAAACES2
Acetic Acid Propyl Ester SCHEMBL105186 0.88 ALDH1A1 (0.53) ALDH1A1TSHRUSP2MAPT
Acetic Acid Butyl Ester SCHEMBL2700544 0.88 ALDH1A1 (0.72) ALDH1A1TSHRMAPTKDM4EDUSP3
Acetic Acid Pentyl Ester SCHEMBL3264540 0.88 ALDH1A1 (0.71) ALDH1A1TSHRNAAACES2EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023131530-A1 A CLEANING COMPOSITION FOR METAL SUBSTRATES PRETREATMENT AND ITS PREPARATION METHOD AND APPLICATION THEREOF BASF COATINGS GMBH (DE) 2023-07-13 WO disclosed
CN-114787717-A Processing liquid and pattern forming method 富士胶片株式会社 2022-07-22 CN disclosed
US-20210114967-A1 RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD KANEKA CORPORATION (JP) 2021-04-22 US disclosed
EP-3806593-A1 RESIST COMPOSITION FOR PATTERN PRINTING USE, AND METHOD FOR MANUFACTURING CIRCUIT PATTERN USING SAME KANEKA CORPORATION (JP) 2021-04-14 EP disclosed
US-20210103216-A1 RESIST COMPOSITION FOR PATTERN PRINTING, AND PRODUCTION METHOD OF CIRCUIT PATTERNS USING THE SAME KANEKA CORPORATION (JP) 2021-04-08 US disclosed
US-10759989-B2 Temperature-stable paraffin inhibitor compositions ECOLAB USA INC. (US) 2020-09-01 US disclosed
EP-3400369-A1 TEMPERATURE-STABLE PARAFFIN INHIBITOR COMPOSITIONS Ecolab Usa Inc. (US) 2018-11-14 EP disclosed
WO-2017120286-A1 TEMPERATURE-STABLE PARAFFIN INHIBITOR COMPOSITIONS ECOLAB USA INC. (US) 2017-07-13 WO disclosed
US-20170190949-A1 TEMPERATURE-STABLE PARAFFIN INHIBITOR COMPOSITIONS NORRISEAL-WELLMARK, INC. 2017-07-06 US disclosed
US-8741809-B2 Liquid pyraclostrobin-containing crop protection formulations BASF SE (DE) 2014-06-03 US disclosed
US-20110195846-A1 Liquid Pyraclostrobin-Containing Crop Protection Formulations BASF SE (DE) 2011-08-11 US disclosed
CN-101359656-B Image sensor package and fabrication method thereof VISERA TECHNOLOGIES CO LTD 2010-10-13 CN disclosed
CN-100475922-C Nano composite normal temperature type gage mark coating and preparation method thereof SUZHOU ZHONGKE NANOTECH COATIN (CN) 2009-04-08 CN disclosed
CN-101359656-A Image sensor package and fabrication method thereof VISERA TECHNOLOGIES CO LTD (CN) 2009-02-04 CN disclosed
CN-100371402-C Infrared resistant coating and preparation process DONGDONG CHEN (CN) 2008-02-27 CN disclosed
CN-1927964-A Infrared resistant coating and preparation process CHEN DONGDONG (CN) 2007-03-14 CN disclosed
CN-1923927-A Nano composite normal temperature type gage mark coating and preparation method thereof ZHONGKE NANOTECH COATING SHUZH (CN) 2007-03-07 CN disclosed
US-20060177767-A1 Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. 2006-08-10 US disclosed