Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Acetic Acid Propyl Ester. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.39 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.39 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.39 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.39 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.39 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.39 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.39 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.39 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid Propyl Ester SCHEMBL1445156 | 0.92 | ALDH1A1 (0.52) | ALDH1A1TSHRHSD17B10LMNACHRM5 | |
| Acetic Acid Propyl Ester SCHEMBL10320542 | 0.90 | ALDH1A1 (0.50) | ALDH1A1TSHRHSD17B10LMNACHRM5 | |
| Acetic Acid Butyl Ester SCHEMBL107642 | 0.89 | ALDH1A1 (0.62) | ALDH1A1TSHRHSD17B10LMNACHRM5 | |
| Acetic Acid Propyl Ester SCHEMBL4329572 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TSHRHSD17B10LMNACHRM5 | |
| Acetic Acid Pentyl Ester SCHEMBL2269446 | 0.88 | ALDH1A1 (0.55) | ALDH1A1TSHRUSP2MAPT | |
| Propylene Glycol SCHEMBL28765888 | 0.87 | ALDH1A1 (0.73) | ALDH1A1TSHRHSD17B10LMNACHRM5 | |
| Ethyl Acetate SCHEMBL65476 | 0.86 | ALDH1A1 (0.58) | ALDH1A1TSHRHSD17B10LMNACHRM5 | |
| Hexyl Acetate SCHEMBL896029 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRUSP2MAPT | |
| Tetradecylacetate SCHEMBL466058 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRUSP2MAPT | |
| Acetic Acid Propyl Ester SCHEMBL262663 | 0.86 | ALDH1A1 (0.70) | ALDH1A1TSHRHSD17B10LMNACHRM5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 10058 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-122095033-A | Formulations | — | 2026-05-26 | — | — | CN | claimed |
| WO-2026104328-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2026-05-21 | — | — | WO | claimed |
| CN-122037616-A | Pigment red 254 kneading inducer and application thereof | 重庆安尚科技有限公司 | 2026-05-15 | — | — | CN | claimed |
| EP-4072992-B1 | COMPOSITION | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-04-08 | — | — | EP | claimed |
| EP-4720077-A1 | ORGANOMETALLIC TIN OXO CARBOXYLATE CLUSTERS WITH MIXED ORGANIC LIGANDS FOR EUV LITHOGRAPHY | Merck Patent GmbH (DE) | 2026-04-08 | — | — | EP | claimed |
| CN-121578590-A | Composition for forming lower layer film of patterning material and lower layer film of patterning material | 珠海基石科技有限公司 | 2026-02-27 | — | — | CN | claimed |
| US-20260016747-A1 | RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-01-15 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| US-12393122-B2 | Thinner composition and method of processing surfaces of semiconductor substrates | SK Hynix Inc. (KR) | 2025-08-19 | — | — | US | claimed |
| WO-2005015635-A2 | SPIN ON POLYMERS FOR ORGANIC MEMORY DEVICES | ADVANCED MICRO DEVICES, INC. (US) | 2005-02-17 | — | — | WO | claimed |
| US-6794108-B1 | COMPOUND CAPABLE OF GENERATING ACID BY ACTINIC RADIATION; POLYMER AND COMPOUND THAT DECOMPOSE TO A SULFONIC ACID; STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-21 | — | — | US | claimed |
| US-6656763-B1 | Spin on polymers for organic memory devices | ADVANCED MICRO DEVICES, INC. | 2003-12-02 | — | — | US | claimed |
| EP-1336609-A2 | Recovery of 3,4-epoxy-1-butene by extractive distillation | EASTMAN CHEMICAL COMPANY (US) | 2003-08-20 | — | — | EP | claimed |
| US-6582565-B1 | Recovery of 3,4-epoxy-1-butene by extractive distillation | EASTMAN CHEMICAL COMPANY | 2003-06-24 | — | — | US | claimed |
| US-20020132123-A1 | Thermosetting anti-reflective coatings for full-fill dual damascene process | BREWER SCIENCE, INC. | 2002-09-19 | — | — | US | claimed |
| US-6444320-B1 | CAN BE USED TO PROTECT CONTACT OR VIA HOLES FROM DEGRADATION DURING SUBSEQUENT ETCHING IN THE DUAL DAMASCENE | BREWER SCIENCE | 2002-09-03 | — | — | US | claimed |
| US-6395450-B1 | MIXTURE OF ACID GENERATOR, BINDER AND SOLVENT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-05-28 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-5422221-A | Hydrogen atoms of hydroxyl groups in novolac resin replaced by 1,2-naphthoquinonediazidosulfonyl group; sensitiivity, resolution, heat resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-06-06 | — | — | US | claimed |