SCHEMBL2270563

SCHEMBL2270563

Cl[SiH2]C=Cc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.50
NFE2L2 Q16236 4/20 0.43
ALDH1A1 P00352 2/20 0.42
LMNA P02545 2/20 0.42
MAPK1 P28482 2/20 0.42
CYP19A1 P11511 2/20 0.42
MAOA P21397 2/20 0.42
TRPA1 O75762 1/20 0.42
ALOX5 P09917 1/20 0.42
MAPT P10636 2/20 0.41
RECQL P46063 2/20 0.41
HDAC3 O15379 1/20 0.41
TNKS O95271 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HCAR2 Q8TDS4 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC10 Q969S8 1/20 0.41
HDAC11 Q96DB2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butadiene SCHEMBL28480961 0.91 ALDH1A1 (0.42) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL29076631 0.78 MAOB (0.55) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL5617360 0.74 MAOB (0.50) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL5617362 0.74 MAOB (0.50) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL1066601 0.74 MAOB (0.50) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL9202420 0.74 MAOB (0.50) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL8845315 0.74 MAOB (0.50) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL355020 0.74 MAOB (0.50) MAOBNFE2L2ALDH1A1LMNAMAPK1
SCHEMBL2841064 0.73 MAOB (0.44) MAOBNFE2L2ALDH1A1LMNAMAPK1
(Z)-1,2-Diphenylethene SCHEMBL443 0.73 MAOB (0.73) MAOBNFE2L2ALDH1A1LMNAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-4417069-A FROM STYRENE AND CHLOROSILANE, PLATINUM CATALYST AND TERTIARY AMINE GENERAL ELECTRIC COMPANY (US) 1983-11-22 US disclosed