Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.64 |
| ▸ | TP53 | P04637 | 3/20 | 0.64 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.64 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.64 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.64 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 8/20 | 0.50 |
| ▸ | THRB | P10828 | 4/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.30 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.30 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL268415 | 0.92 | TSHR (0.55) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL4096763 | 0.92 | TSHR (0.55) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL134216 | 0.87 | ALDH1A1 (0.78) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL22264522 | 0.87 | ALDH1A1 (0.78) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL9577936 | 0.87 | ALDH1A1 (0.78) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| Formaldehyde SCHEMBL23716978 | 0.85 | ALDH1A1 (0.75) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL5583873 | 0.85 | ALDH1A1 (0.75) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL17685546 | 0.85 | ALDH1A1 (0.75) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL5278958 | 0.85 | ALDH1A1 (0.75) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL9514619 | 0.85 | ALDH1A1 (0.81) | ALDH1A1TP53HIF1ACYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024204175-A1 | MICROWELL FILM FOR BIOASSAY, METHOD FOR PRODUCING SAME, AND PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY | 旭化成株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-11275273-B2 | Optical device and refresh driving method for optical device | KYOTO UNIVERSITY (JP) | 2022-03-15 | — | — | US | disclosed |
| CN-114051514-A | Microporous film for bioassay, photosensitive resin composition for forming microporous film for bioassay, and method for producing microporous film for bioassay | 旭化成株式会社 | 2022-02-15 | — | — | CN | disclosed |
| US-20210191170-A1 | OPTICAL DEVICE AND REFRESH DRIVING METHOD FOR OPTICAL DEVICE | KYOTO UNIVERSITY (JP) | 2021-06-24 | — | — | US | disclosed |
| US-11029597-B2 | Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate | FUJIFILM CORPORATION (JP) | 2021-06-08 | — | — | US | disclosed |
| US-10914987-B2 | Complex and optical element | KYOTO UNIVERSITY (JP) | 2021-02-09 | — | — | US | disclosed |
| WO-2021002388-A1 | MICROWELL FILM FOR BIOASSAY, PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY, AND METHOD FOR MANUFACTURING MICROWELL FILM FOR BIOASSAY | 旭化成株式会社 | 2021-01-07 | — | — | WO | disclosed |
| US-20200241336-A1 | COMPLEX AND OPTICAL ELEMENT | KYOTO UNIVERSITY (JP) | 2020-07-30 | — | — | US | disclosed |
| US-10373863-B2 | Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure | FUJIFILM CORPORATION (JP) | 2019-08-06 | — | — | US | disclosed |
| US-10189928-B2 | Curable composition, pattern forming method, pattern, and method for manufacturing device | FUJIFILM CORPORATION (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20100009138-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009287-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20090283937-A1 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090011367-A1 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080119583-A1 | Brightness Enhancement Film Comprising Polymerized Organic Phase Having Low Glass Transition Temperature | 3M INNOVATIVE PROPERTIES COMPANY | 2008-05-22 | — | — | US | disclosed |
| US-7361409-B2 | Microstructured article comprising a polymerized composition having low glass transition temperature | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2008-04-22 | — | — | US | disclosed |
| US-20070138691-A1 | FLEXIBLE MOLD, PRODUCTION METHOD THEREOF AND PRODUCTION METHOD OF FINE STRUCTURES | 3M INNOVATIVE PROPERTIES COMPANY | 2007-06-21 | — | — | US | disclosed |
| US-20060187366-A1 | MICROSTRUCTURED ARTICLE COMPRISING A POLYMERIZED COMPOSITION HAVING LOW GLASS TRANSITION TEMPERATURE | 3M INNOVATIVE PROPERTIES COMPANY | 2006-08-24 | — | — | US | disclosed |
| EP-1658176-A1 | FLEXIBLE MOLD, PRODUCTION METHOD THEREOF AND PRODUCTION METHOD OF FINE STRUCTURES | 3M Innovative Properties Company (US) | 2006-05-24 | — | — | EP | disclosed |
| WO-2005021260-A1 | FLEXIBLE MOLD, PRODUCTION METHOD THEREOF AND PRODUCTION METHOD OF FINE STRUCTURES | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-03-10 | — | — | WO | disclosed |