SCHEMBL22763314

SCHEMBL22763314

CCCC1C(CC)CC2CCCCC21

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ CA4 P22748 1/20 0.35
▸ CHRM2 P08172 1/20 0.31
▸ CHRM1 P11229 1/20 0.31
▸ NOS3 P29474 1/20 0.30
▸ NOS1 P29475 1/20 0.30
▸ NOS2 P35228 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24287742 0.85 CA1 (0.35) CA1CA2CA4NOS3NOS1
SCHEMBL24287536 0.73 CA1 (0.39) CA1CA2CA4
SCHEMBL5341577 0.69 — —
SCHEMBL20412506 0.69 NOS1 (0.33) CA1CA2CA4NOS1NOS2
SCHEMBL19142498 0.68 CHRM2 (0.33) CA1CA2CA4CHRM2CHRM1
SCHEMBL9637783 0.67 CA1 (0.45) CA1CA2CA4
SCHEMBL24798469 0.67 CA1 (0.31) CA1CA2CA4
SCHEMBL5547886 0.67 CA1 (0.50) CA1CA2CA4
SCHEMBL5441661 0.67 MAPT (0.32) CA1CA2
SCHEMBL24798983 0.67 CA1 (0.33) CA1CA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709429-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
US-20200387071-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-10 — — US disclosed
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