⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1314190 | 0.88 | SHBG (0.31) | — | |
| SCHEMBL1169447 | 0.86 | — | — | |
| SCHEMBL2276206 | 0.85 | — | — | |
| SCHEMBL2274018 | 0.73 | ALDH1A1 (0.40) | — | |
| SCHEMBL28434138 | 0.72 | CYP1A2 (0.33) | — | |
| SCHEMBL1313401 | 0.71 | SHBG (0.31) | — | |
| SCHEMBL7149995 | 0.71 | ALDH1A1 (0.32) | — | |
| SCHEMBL196806 | 0.71 | SHBG (0.31) | — | |
| SCHEMBL8761890 | 0.71 | SHBG (0.31) | — | |
| SCHEMBL13270307 | 0.71 | SHBG (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130260575-A1 | SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-03 | — | — | US | claimed |
| WO-2011106218-A2 | ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2011-09-01 | — | — | WO | claimed |
| US-20110206857-A1 | ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2011-08-25 | — | — | US | claimed |
| US-20130260575-A1 | SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-03 | — | — | US | disclosed |
| US-20110206857-A1 | ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2011-08-25 | — | — | US | disclosed |