Methane

Methane

SCHEMBL2283545

C.Oc1cccc(-c2ccccc2)c1O

nearest known ligand 0.65

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.65
HPGD P15428 4/20 0.65
HSD17B10 Q99714 4/20 0.65
BCL2L1 Q07817 1/20 0.65
HDAC4 P56524 2/20 0.56
HDAC2 Q92769 2/20 0.56
HDAC8 Q9BY41 2/20 0.56
HDAC6 Q9UBN7 1/20 0.56
HNF4A P41235 1/20 0.55
BACE1 P56817 3/20 0.54
LMNA P02545 3/20 0.50
ALOX15 P16050 3/20 0.50
TDP1 Q9NUW8 3/20 0.50
EGFR P00533 2/20 0.50
CA2 P00918 2/20 0.50
FYN P06241 2/20 0.50
MMP9 P14780 2/20 0.50
RECQL P46063 2/20 0.50
ADAMTS4 O75173 1/20 0.50
CA1 P00915 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL94298 0.98 ALDH1A1 (0.68) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
SCHEMBL29365218 0.98 ALDH1A1 (0.68) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
SCHEMBL28750451 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
Ammonia Solution, Strong SCHEMBL19405739 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
SCHEMBL2064516 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
Biphenyl SCHEMBL25432905 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
Water SCHEMBL8773056 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
Hydrogen Sulfide SCHEMBL27783553 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
Hydrochloric Acid SCHEMBL28294812 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
Hydrogen Sulfide SCHEMBL27403486 0.95 ALDH1A1 (0.65) ALDH1A1HPGDHSD17B10BCL2L1HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118320644-A Organic solvent-resistant separation membrane and preparation method thereof 苏州纳信膜技术有限公司 2024-07-12 CN claimed
CN-117801252-A Preparation process of polycarbonate 万华化学集团股份有限公司 2024-04-02 CN claimed
CN-113845656-B Composition for preparing glass-like body, preparation method and application thereof 江苏富琪森新材料有限公司 2023-09-15 CN claimed
CN-116675861-A Preparation method of modified polyethersulfone/polyetherimide polymer alloy 深圳先进技术研究院 2023-09-01 CN claimed
CN-114057980-B Self-dispersible ester-soluble polyurethane ink resin, preparation method and ink 万华化学(北京)有限公司 2023-07-14 CN claimed
CN-115109182-B Alkali-soluble acrylamide resin and metal stripping adhesive composition containing same 儒芯微电子材料(上海)有限公司 2023-06-23 CN claimed
CN-114057980-A Self-dispersible ester-soluble polyurethane ink resin, preparation method and ink 万华化学(北京)有限公司 2022-02-18 CN claimed
CN-108779248-B Benzylated Mannich base curatives, compositions, and methods 赢创运营有限公司 2021-08-13 CN claimed
CN-106432743-B Block copolymer for toughening resin and preparation method thereof 吉林大学 2019-12-31 CN claimed
CN-109081920-B Prepolymer containing sulfoxide structure, preparation method thereof and advanced composite material 吉林大学 2019-12-06 CN claimed
CN-106432743-A Block copolymer for toughening resin and preparation method thereof 吉林大学 2017-02-22 CN claimed
CN-105622886-A Alcohol/water-soluble polyurethane resin used for intaglio ink and preparation method thereof WANHUA CHEMICAL (BEIJING) CO LTD 2016-06-01 CN claimed
CN-1938379-B Impact-modified compositions and methods GEN ELECTRIC 2012-05-16 CN claimed
CN-1938379-A Impact-modified compositions and methods GEN ELECTRIC (US) 2007-03-28 CN claimed
CN-118320644-A Organic solvent-resistant separation membrane and preparation method thereof 苏州纳信膜技术有限公司 2024-07-12 CN disclosed
CN-114761513-B Sealing member for semiconductor manufacturing apparatus 三菱电线工业株式会社 2024-07-12 CN disclosed
CN-118295211-A Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board 深圳市容大感光科技股份有限公司 2024-07-05 CN disclosed
EP-1516030-A1 PHOTOCURABLE ADHESIVE COMPOSITIONS, REACTION PRODUCTS OF WHICH HAVE LOW HALIDE ION CONTENT Loctite (R & D) Limited (IE) 2005-03-23 EP disclosed
WO-2004000965-A1 PHOTOCURABLE ADHESIVE COMPOSITIONS, REACTION PRODUCTS OF WHICH HAVE LOW HALIDE ION CONTENT LOCTITE (R & D) LIMITED (IE) 2003-12-31 WO disclosed
CN-1103062-A Method for recovering bis hydroxy aromatic organic values and bis ary carbonate values from scrap aromatic polycarbonate GEN ELECTRIC (US) 1995-05-31 CN disclosed