SCHEMBL22840995

SCHEMBL22840995

C=C(C)C(=O)O[C@]1(C)CC(=O)OC1C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6701612 1.00 ALDH1A1 (0.33) ALDH1A1
SCHEMBL9880100 0.86 ALDH1A1 (0.33) ALDH1A1
Methacrylic Acid SCHEMBL18424701 0.83
SCHEMBL22877558 0.79 ALDH1A1 (0.34) ALDH1A1
SCHEMBL22877669 0.79 ALDH1A1 (0.34) ALDH1A1
SCHEMBL22877371 0.79 ALDH1A1 (0.34) ALDH1A1
SCHEMBL15946503 0.78 ALDH1A1 (0.30) ALDH1A1
SCHEMBL15946493 0.78 ALDH1A1 (0.33) ALDH1A1
SCHEMBL23058296 0.76 PPARG (0.30)
SCHEMBL22877660 0.76 SMN1; SMN2 (0.32) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3757676-A1 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD THEREFOR, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-12-30 EP disclosed