SCHEMBL2284308

SCHEMBL2284308

Cc1ccc([S+](c2ccc(C)cc2)c2ccc(OS(=O)(=O)c3ccc(C)cc3)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.51
KMT2A Q03164 3/20 0.51
CA2 P00918 3/20 0.49
ALDH1A1 P00352 3/20 0.49
CA12 O43570 2/20 0.49
MAPT P10636 2/20 0.49
HTT P42858 2/20 0.49
PPARG P37231 1/20 0.49
CA1 P00915 1/20 0.48
CA9 Q16790 1/20 0.48
ENPP2 Q13822 4/20 0.48
ENPP3 O14638 3/20 0.48
ENPP1 P22413 3/20 0.48
LMNA P02545 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
NPSR1 Q6W5P4 2/20 0.45
CYP3A4 P08684 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C9 P11712 1/20 0.45
CYP2C19 P33261 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5709625 0.95 MEN1 (0.48) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL547500 0.94 TDP1 (0.50) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL5709631 0.89 TDP1 (0.46) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL2284374 0.89 MEN1 (0.58) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL4126086 0.89 MEN1 (0.60) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL9852204 0.89 MEN1 (0.60) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL18179825 0.89 MEN1 (0.60) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL751397 0.88 MEN1 (0.50) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL382761 0.88 TDP1 (0.47) MEN1KMT2ACA2ALDH1A1CA12
Iodide SCHEMBL22068772 0.87 CA2 (0.59) MEN1KMT2ACA2ALDH1A1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X MEN1 4079/4885KMT2A 1677/4885CA2 1095/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.